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Laser Processing: Surface Treatment and Film Deposition pp 665–691Cite as

Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings

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Part of the book series: NATO ASI Series ((NSSE,volume 307))

Abstract

This article is primarily concerned with the laser-assisted chemical vapour deposition (LCVD) of titanium nitride and titanium carbide coatings. The principles of the LCVD technique are briefly outlined and the literature on the LCVD of TiN and TiC films is reviewed. Emphasis is given to the growth mechanisms and to the morphological and structural aspects of the films.

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Author information

Authors and Affiliations

  1. Department of Physics, University of Lisbon, Campo Grande Ed. C1, 1700, Lisboa, Portugal

    O. Conde, A. J. Silvestre & M. L. Paramés

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  1. O. Conde
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  2. A. J. Silvestre
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  3. M. L. Paramés
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Editor information

Editors and Affiliations

  1. Department of Mechanical and Industrial Engineering, University of Illinois, Urbana-Champaign, IL, USA

    J. Mazumder

  2. Department of Physics, University of Lisbon, Lisbon, Portugal

    O. Conde

  3. Department of Materials Engineering, Instituto Superior Técnico, Lisbon, Portugal

    R. Villar

  4. Department of Mechanical Engineering, University of Liverpool, Liverpool, UK

    W. Steen

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© 1996 Kluwer Academic Publishers

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Conde, O., Silvestre, A.J., Paramés, M.L. (1996). Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings. In: Mazumder, J., Conde, O., Villar, R., Steen, W. (eds) Laser Processing: Surface Treatment and Film Deposition. NATO ASI Series, vol 307. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-0197-1_34

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  • DOI: https://doi.org/10.1007/978-94-009-0197-1_34

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-6572-6

  • Online ISBN: 978-94-009-0197-1

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