Abstract
The aim of advanced optical fabrication is to produce highly accurate optical surface with better reproducibility. It demands a good control and systematic understanding of the process and its parameters. Optical polishing process defines the final surface figure and finish of the component. Controlled amount of finishing forces and material removal rate are necessary for polishing of brittle materials. However, the conventional or full aperture polishing process still depends on the operator’s skills to achieve the desired surface figure and finish. The process may be well optimized at individual manufacturing setups but there appears to be a little prediction about polishing outputs. Thus, it is essential to study the fundamental mechanisms of material removal during polishing in order to achieve the accurate prediction of process outputs. This paper reviews the work carried out in the area of full aperture optical polishing.
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- R a :
-
Average surface roughness
- k :
-
Preston’s constant
- P :
-
Pressure
- V :
-
Relative velocity
- E :
-
Workpiece Young’s modulus
- ρ w :
-
Wafer density
- N :
-
Number of active abrasives
- V rem :
-
Volume removed by single abrasive
- n :
-
Number of effective abrasive particles
- δ aw :
-
Penetration depth of single abrasive particle into the wafer-abrasive interface
- R aw :
-
Radius of contact area of a single effective abrasive at wafer-pad asperity interface
- C :
-
Constant
- x :
-
Slurry concentration
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Acknowledgments
The authors are thankful to Director, CSIR-Central Scientific Instruments Organisation, Chandigarh for providing the necessary resources and facilities for performing this study.
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Pal, R.K., Garg, H., Karar, V. (2016). Full Aperture Optical Polishing Process: Overview and Challenges. In: Mandal, D.K., Syan, C.S. (eds) CAD/CAM, Robotics and Factories of the Future. Lecture Notes in Mechanical Engineering. Springer, New Delhi. https://doi.org/10.1007/978-81-322-2740-3_45
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DOI: https://doi.org/10.1007/978-81-322-2740-3_45
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