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Format-Independent CAD Software for VLSI Mask Data Preparation

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Advanced Computer Graphics

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Abstract

IC design database consists of several graphic layers. Manufacturing is based on exposing a glass plate or a silicon wafer to patterns of light, derived from the graphic database. This paper deals with a class of strip-based pattern generators (PG), for which each graphic layer needs fo be partitioned into tiles of machine-dependent dimensions. Format-independent partitioning methodology is shown. It consists of graphic boolean operations between machine-dependent “checkerboard” layer and the design graphic layer. Since these operators are assumed to be off-the-shelf general purpose modules, the new method saves the development of different partitioning modules for different pattern generators.

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Reference

  • Fay et al. (1976) X-Ray replication of masks using the synchrotron radiation produced by the ACO storage ring. App. Phys. Lett. 29: 370–372.

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Author information

Authors and Affiliations

  1. SILVAR-LISCO/NCA Corporation, 3250 Jay Street, Santa Clara, CA, 95054, USA

    Yehuda Shiran

Authors
  1. Yehuda Shiran
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Editor information

Editors and Affiliations

  1. Kunii Laboratory of Computer Science Department of Information Science Faculty of Science, The University of Tokyo, Japan

    Tosiyasu L. Kunii (Professor and Director) (Professor and Director)

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© 1986 Springer-Verlag Tokyo

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Shiran, Y. (1986). Format-Independent CAD Software for VLSI Mask Data Preparation. In: Kunii, T.L. (eds) Advanced Computer Graphics. Springer, Tokyo. https://doi.org/10.1007/978-4-431-68036-9_28

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  • DOI: https://doi.org/10.1007/978-4-431-68036-9_28

  • Publisher Name: Springer, Tokyo

  • Print ISBN: 978-4-431-68038-3

  • Online ISBN: 978-4-431-68036-9

  • eBook Packages: Springer Book Archive

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