Skip to main content

Advanced Models for Practical Devices

  • Chapter
  • First Online:
Work Function and Band Alignment of Electrode Materials

Part of the book series: NIMS Monographs ((NIMSM))

Abstract

In this chapter, control of the band alignment in nonideal case is discussed. A parameter \(\Delta\), potential gap at the interface is introduced to consider nonideality. Several models on the origin of nonideality are explained: metal-induced gap state model, disorder-induced gas state model, interface-induced gap states model. In principle, interface states are generated at the interface and electrons fill these states from the lowest states. The energy level of interface states that is composed of 50% of the valence and 50% of conduction bands, is called the charge neutrality level (CNL), because if electrons fill up to CNL, the semiconductor becomes charge-neutral. The highest energy level electrons fill is usually different from the Fermi level, which results in the potential gap \(\Delta\) in any models. The origin of the interface states differs from model to model. Potential gap \(\Delta\) is related to S parameter and S parameter is related to optical dielectric constant of semiconductors or insulator in contact with the metal. Experimental examples are demonstrated to show that S parameter is modified by inserting ultrathin insulating layer between metal and semiconductor. It confirms that the modification of band alignment using S parameter is effective.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

eBook
USD 16.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 16.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Change history

  • 19 February 2021

    â– â– â– 

References

  1. Mönch W (1987) Role of virtual gap states and defects in metal-semiconductor contacts. Phys Rev Lett 58:1260–1263

    Article  ADS  Google Scholar 

  2. Mönch W (1990) On the physics of metal-semiconductor interfaces. Rep Prog Phys 53:221–278

    Article  ADS  Google Scholar 

  3. Yeo YC (2004) Metal gate technology for nanoscale transistors—material selection and process integration issues. Thin Solid Films 462–463:34–41

    Article  ADS  Google Scholar 

  4. Robertson J (2006) High dielectric constant gate oxides for metal oxide Si transistors. Rep Prog Phys 69:327–396

    Article  ADS  Google Scholar 

  5. Heine V (1965) Theory of surface states. Phys Rev 138:A1689–A1696

    Article  ADS  Google Scholar 

  6. Tersoff J (1984) Schottky barrier heights and the continuum of gap states. Phys Rev Lett 52:465–468

    Article  ADS  Google Scholar 

  7. Tung RT (2000) Chemical bonding and Fermi level pinning at metal-semiconductor interfaces. Phys Rev Lett 84:6078–6081

    Article  ADS  Google Scholar 

  8. McKee RA, Walker FJ, Nardelli MB, Shelton WA, Stocks GM (2003) The interface phase and the Schottky barrier for a crystalline dielectric on silicon. Science 300:1726–1730

    Article  ADS  Google Scholar 

  9. Mönch W (2011) Branch-point energies and the band-structure lineup at Schottky contacts and heterostructures. J Appl Phys 109:113724-1-113724–10

    Article  ADS  Google Scholar 

  10. Yeo YC, King TJ, Hu C (2002) Metal-dielectric band alignment and its implications for metal gate complementary metal-oxide-semiconductor technology. J Appl Phys 92:7266–7271

    Article  ADS  Google Scholar 

  11. Mönch W (1988) Mechanisms of Schottky-barrier formation in metal–semiconductor contacts. J Vac Sci Technol B 6:1270–1276

    Article  Google Scholar 

  12. Young KF, Frederikse HPR (1973) Compilation of the static dielectric constant of inorganic solids. J Phys Chem Ref Data 2:313–409

    Article  ADS  Google Scholar 

  13. Hara S (2001) The Schottky limit and a charge neutrality level found on metal/6H-SiC interfaces. Surf Sci 494:L805–L810

    Article  ADS  Google Scholar 

  14. Lu W, Collins WE, Mitchel WC (2004) SiC power materials: devices and applications. In: Feng ZC (ed) Springer series in materials science. Springer-Verlag, Berlin

    Google Scholar 

  15. Hayashi N, Ito E, Oji H, Yoshimura D, Seki K (2001) Energy level alignment and band bending at TPD/metal interfaces studied by Kelvin probe method. Synth Met 121:1717–1718

    Article  Google Scholar 

  16. Mönch W (2012) On the alleviation of Fermi-level pinning by ultrathin insulator layers in Schottky contacts. J Appl Phys 111:073706-1-073706–7

    Article  ADS  Google Scholar 

  17. Tsui BY, Kao MH (2013) Mechanism of Schottky barrier height modulation by thin dielectric insertion on n-type germanium. Appl Phys Lett 103:032104-1-032104–4

    ADS  Google Scholar 

  18. Shiraishi K, Nakayama T, Akasaka Y, Miyazaki S, Nakaoka T, Ohmori K, Ahmet P, Torii K, Watanabe H, Chikyow T, Nara Y, Iwai H, Yamada K (2006) New theory of effective work functions at metal/high-k dielectric interfaces—application to metal/high-k HfO2 and La2O3 dielectric interfaces. ECS Trans 2:25–40

    Google Scholar 

  19. Nakayama T, Shiraishi K, Miyazaki S, Akasaka Y, Nakaoka T, Torii K, Ohta A, Ahmet P, Ohmori K, Umezawa N, Watanabe H, Chikyow T, Nara Y, Iwai H, Yamada K (2006) Physics of metal/high-k interfaces. ECS Trans 3:129–140

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Michiko Yoshitake .

Rights and permissions

Reprints and permissions

Copyright information

© 2021 National Institute for Materials Science, Japan

About this chapter

Check for updates. Verify currency and authenticity via CrossMark

Cite this chapter

Yoshitake, M. (2021). Advanced Models for Practical Devices. In: Work Function and Band Alignment of Electrode Materials. NIMS Monographs. Springer, Tokyo. https://doi.org/10.1007/978-4-431-56898-8_6

Download citation

Publish with us

Policies and ethics