Skip to main content

A TCAD Framework for Development and Manufacturing

  • Conference paper

Abstract

The semiconductor manufacturing engineer is often faced with the problems of process integration, equipment control, parametric yield diagnosis, process centering, worst-case design, and device parameter extraction. These problems require the use of technology CAD (TCAD) tools across a spectrum of speed and accuracy. We have developed a specialized TCAD framework to integrate the required tools and auxiliary software into a system that is convenient for everyday use. The initial work was embodied in the PREDITOR system, and has now evolved into pdFab, a commercial product. In this paper, we will describe the PREDITOR and pdFab systems, and show experimental results of using pdFab on industrial problems.

This is a preview of subscription content, log in via an institution.

Buying options

Chapter
USD   29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD   39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD   54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Learn about institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. A. Wong (ed.). Semiconductor Wafer Representation Architecture Document V1.0. Technical Report CFI Document TCAD-91-G-1, CAD Framework Initiative, July, 1992.

    Google Scholar 

  2. D. S. Boning and D. A. Antoniadis. MASTIF - A Workstation Approach to Fabrication Process Design. IEEE International Conference on Computer-Aided Design (ICCAD) Digest of Technical Papers, pages 280–282. November, 1985.

    Google Scholar 

  3. D. S. Boning, ed. Technology CAD Frametivork Architecture. Technical Report S90013, Semiconductor Research Corporation, May, 1990.

    Google Scholar 

  4. D. S. Boning, M. L. Ileytens and A. S. Wong. The Intertool Profile Interchange Format: An Object-Oriented Approach. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 10 (9): 1150–1156, September, 1990.

    Google Scholar 

  5. J. B. Brockman and S. W. Director. The Hercules CAD Task Management System. IEEE International Conference on Computer-Aided Design (ICCAD) Digest of Technical Papers, pages 254257. IEEE, November, 1991.

    Google Scholar 

  6. S. Cl. Duvall. An Interchange Format for Process and Device Simulation. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 7 (7): 741–754, July, 1988.

    Google Scholar 

  7. D. Collins and A. Strojwas. A Methodology for the Development of Semiconductor Equipment/ Process Models. Symposium on Automated Integrated Circuits Manufacturing. Proceedings of Fifth Symposium(90–3):66–77, March, 1990.

    Google Scholar 

  8. F. Fasching, C. Fischer, S. Selberherr, II. Stippel, W. Tuppa, and H. Read. A PIF Implementation for TCAD Purposes. Simulation of Semiconductor Devices and Processes (SISDEP) Vol. 4, pages 477–482. September, 1991.

    Google Scholar 

  9. M.D. Giles and S. R. Nassif. Unified System for Process and Device Simulation: Proposed Database Inter,- face Format. Technical Report, ATT Bell Laboratories, Allentown, PA, June, 1988.

    Google Scholar 

  10. D. A. Hansen, J. K. Kibarian, H. S. Chen, and D. B. Kao. The Use of Technology CAD in MMCMOS Process Development–Manufacturability and SPICE Model Prediction. TOAD Workshop, National Semiconductor Corporation. May 26–27, 1993.

    Google Scholar 

  11. C. 1-legarty, T. Feudei, N. Hitschfeld, R. Ryter, N. Strecker, M. Westermann, and W. Fichtner. An Approach to Three-Dimensional VLSI Process Simulation. Proceedings of the 178nd Meeting of the Electrochemical Society,pages 565–575. May, 1993.

    Google Scholar 

  12. C. P. Ho, J. D. Plummer, S. E. Hansen, and R. W. Dutton. VLSI Process Modeling - SUPREM-III. IEEE Transactions on Electron Devices. ED-30(11):1438–1453, November, 1983.

    Google Scholar 

  13. J. Hogan. DAC92 Panel - Manufacturing Interface. June, 1992.

    Google Scholar 

  14. M. E. Law and R. W. Dutton. Verification of Analytic Point Defect Models Using SUPREM-IV. IEEE “Transactions on Computer-Aided Design of Integrated Circuits and Systems. 7 (2): 181–190, February, 1988.

    Google Scholar 

  15. K. Lee and A. Neureuther. SIMPL 2: (Simulated Profiles from the Layout–Version 2). IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 7 (2): 160–167, February, 1988.

    Google Scholar 

  16. P. Lloyd, H. K. Dirks, E. J. Prendergast, and K. Singhal. Technology CAD for Competitive Products. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 9 (1): 1209–1216, November, 1990.

    Google Scholar 

  17. K. Lucas and A. J. Strojwas. A New Vector 2D Photolithography Simulation Tool. International Electron Devices Meeting Technical Digest, pages 7.5.1–7.5. 4. IEEE, December, 1992.

    Google Scholar 

  18. W. Maly, A. J. Strojwas, and S. W. Director. Fabrication Based Statistical Design of Monolithic ICs. Proceedings of the IEEE International Symposium on Circuits and Systems, pages 135–138. April, 1981.

    Google Scholar 

  19. W. Maly and A. J. S[rojwas. Statistical Simulation of the IC Manufacturing Process. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 1(3), July, 1982.

    Google Scholar 

  20. J. Mar, K. Bhargavan, S. G. Duvall, R. Firestone, D. J. Lucey, S. N. Nandgaonkar, S. Wu, K. Yu, and F. Zarbakhsh. EASE - An Application-Based CAD System for Process Design. IEEE Transactions on Computer-Aided Design of integrated Circuits and Systems. CAD-6(6):1032–1038, November, 1987.

    Google Scholar 

  21. M. Mcllrath (ed.). Current Concepts in Semiconductor Process Representation V0.2. Technical Report CFI Document (TCAD-91-T-2), CAD Framework Initiative, February, 1991.

    Google Scholar 

  22. P. K. Mozumder and L. M. Loewenstein. Method for Semiconductor Process Optimization Using Functional Representations and Selectivity. IEEE Transactions on Components, Hybrids, and Manufacturing Technology. 15 (3): 311–316, June, 1992.

    Google Scholar 

  23. S. R. Nassif, A. J. Strojwas and S. W. Director. FABRICS II: A Statistically Based IC Fabrication Process Simulator. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. CAD-3(1):40–46, January, 1984.

    Google Scholar 

  24. S. R. Nassif, A. J. Strojwas, and S. W. Director. FABRICS II: A Statistical Simulator of the IC Fabrication Process. IEEE International Conference on Circuits and Computers Proceedings, pages 298–301. September, 1982.

    Google Scholar 

  25. M. S. Obrecht. SIMOS - A Two Dimensional Steady State Simulator forMOS Devices. Solid State Electronics. 34 (7), 1991.

    Google Scholar 

  26. M. S. Obrecht and J. M. G. Teven. BISIM - A Program for Steady-State Two Dimensional Modeling of Various Bipolar Devices. Solid State Electronics. 34 (7), 1991.

    Google Scholar 

  27. J. K. Ousterhout. Tcl: An Embedded Command Language. Winter USENIX Conference Proceedings. 1990.

    Google Scholar 

  28. J. K. Ousterhout. An X11 Toolkit Based on the Tcl Language. Winter USENIX Conference Proceedings. 1991.

    Google Scholar 

  29. E. W. Scheckler, A. S. Wong, R. H. Wang, G. Chin, J. R. Camagna, K. K. H. Toh, K. H. Tadros, R. A. Ferguson, A. R. Neureuther, and R. W. Dutton. A Utility-Based Integrated Process Simulation System. Symposium on VLSI Technology, Digest of Technical Papers, pages 97–98. June, 1990.

    Google Scholar 

  30. M. R. Simpson. PRIDE: An Integrated Design Environment for Semiconductor Device Simulation. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits (NUPAD) III, pages 57–58. June, 1990.

    Google Scholar 

  31. A. J. Strojwas and S. W. Director. The Process Engineer’s Workbench. IEEE Journal of Solid-State Circuits. SC-23(2):377–386, April, 1988.

    Google Scholar 

  32. A. J. Strojwas and S. W. Director. A Process Engineer’s Workbench. Proceedings of the IEEE Custom Integrated Circuits Conference, pages 329–332. IEEE, May, 1987.

    Google Scholar 

  33. W. Fichtner. From Layout to Circuit: Multi-Dimensional Process and Device Simulation - Current Status and Open Problems. 1993 International Workshop on VLSI Process and Device Modeling. May, 1993.

    Google Scholar 

  34. D. M. H. Walker, C. S. Kellen, D. M. Svoboda, and A. J. Strojwas. The CDB/HCDB Semiconductor Wafer Representation Server. IEEE Transactions on Computer-Aided Design of Circcuits and Systems. 12 (2): 283–295, February, 1993.

    Google Scholar 

  35. J. S. Wenstramd, II. Iwai, and R. W. Dutton. A Manufacturing-oriented Environment for Synthesis of Fabrication Processes. IEEE international Conference on Computer-Aided Design (ICCAD) Digest of Technical Papers, pages 376–379. November, 1989.

    Google Scholar 

  36. J. S. Wenstrand, H. Iwai, M. Norishima, H. Tanimoto, T. Wada, and R. W. Dutton. Intelligent Simulation for Optimization of Fabrication Processes. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits (NUPAD) III, pages 15–16. June, 1990.

    Google Scholar 

  37. A. S. Wong, D. S. Boning, M. L. Ileytens, and A. R. Neureuther. The Intertool Profile Interchange Format. Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits (NUPAD) III, pages 61–62. June, 1990.

    Google Scholar 

  38. A. S. Wong and A. R. Neureuther. The Intertool Profile Interchange Format: A Technology CAD Environment Approach. Technical Report. C90361, Semiconductor Research Corporation, July, 1990.

    Google Scholar 

  39. A. S. Wong and A. R. Neureuther. The Intertool Profile Interchange Format: A Technology CAD Environment Approach. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 10 (9): 1157–1162, September, 1991.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1993 Springer-Verlag/Wien

About this paper

Cite this paper

Walker, D.M.H., Kibarian, J.K., Kellen, C.S., Strojwas, A.J. (1993). A TCAD Framework for Development and Manufacturing. In: Fasching, F., Halama, S., Selberherr, S. (eds) Technology CAD Systems. Springer, Vienna. https://doi.org/10.1007/978-3-7091-9315-0_5

Download citation

  • DOI: https://doi.org/10.1007/978-3-7091-9315-0_5

  • Publisher Name: Springer, Vienna

  • Print ISBN: 978-3-7091-9317-4

  • Online ISBN: 978-3-7091-9315-0

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics