Abstract
This paper demonstrates an efficient approach to flash-EEPROM write time simulation. MINIMOS is used to simulate the operation of the MOSFET equivalent device consisting of the Si substrate and the EEPROM’s floating gate. The effective floating gate voltage is determined analytically using the coupling capacitances and the floating gate charge. With this method write time simulation is performed. Making use of selfconsistent trapping calculation, available in our version of MINIMOS, EEPROM write time degradation due to electron trapping in the gate oxide layer is estimated.
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© 1993 Springer-Verlag Wien
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v. Schwerin, A., Bergner, W., Jacobs, H. (1993). Efficient and Accurate Simulation of EEPROM Write Time and its Degradation Using MINIMOS. In: Selberherr, S., Stippel, H., Strasser, E. (eds) Simulation of Semiconductor Devices and Processes. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6657-4_16
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DOI: https://doi.org/10.1007/978-3-7091-6657-4_16
Publisher Name: Springer, Vienna
Print ISBN: 978-3-7091-7372-5
Online ISBN: 978-3-7091-6657-4
eBook Packages: Springer Book Archive