Abstract
A new semiclassical model for the modelling and simulation of the electrical properties of rectifying metal-semiconductor structures has been developed. The contribution of hole current to the total current through the interface is significant for reverse biased Schottky structures and cannot be neglected in the model.
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© 1993 Springer-Verlag Wien
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Donoval, D., Racko, J., Snowden, C.M. (1993). Importance of Hole Generation on Modeling and Simulation of Schottky and MESFET Structures. In: Selberherr, S., Stippel, H., Strasser, E. (eds) Simulation of Semiconductor Devices and Processes. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6657-4_120
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DOI: https://doi.org/10.1007/978-3-7091-6657-4_120
Publisher Name: Springer, Vienna
Print ISBN: 978-3-7091-7372-5
Online ISBN: 978-3-7091-6657-4
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