Stress Modelling of Multi Level Interconnect Schemes For Future Deep Submicron Device Generations

Abstract

Copper and low dielctric constantant (k) materials are poised to become the dominant interconnect scheme for integrated circuits for the future because of the low resistance and capacitance that they offer which can improve circuit performance by more than 30% over conventional interconnect schemes. This paper addresses the thermomechanical stresses in the Cu/Low k interconnect scheme through numerical simulation and identifies the locations of maximum stress in the structure with view to providing information on the impact that different dielectric materials have on the stress distribution in the interfaces between metals and dielectric layers.