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Nanoimprint Technologies

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Nanofabrication

Abstract

The advances in nanosciences, micro- and nanotechnology are driving the research and development efforts to fabricate micro- and nano-structures with a high precision in a wide variety of materials using novel lithography methods. These emerging techniques, which include self-assembly, scanning probes, micro-contact printing, and nanoimprint lithography (NIL), are intensively studied to, on the one hand, assess to what degree they meet the demands of ultrahigh precision and high density of nanostructures posed by the semiconductor industry and, on the other hand, to examine them with respect to cost-efficiency to produce components for photonic, data storage, sensing and fluidic or biological applications. This chapter focuses on recent advances in nanoimprint lithography as it is perhaps among the most mature emerging nanofabrication methods. Nanoimprint lithography technology faces some challenges to reach the requirements of the semiconducting integrated circuits manufacturers in terms of overlay accuracy, defectivity and throughput but it meets already some needs of data storage, light extraction, fluidic and biological applications. Significant efforts are currently being made to develop parallel printing on large area and step and repeat techniques. In this chapter, we review the principles of nanoimprint lithography and its capability to scale-up the replication of nanostructures by parallel printing, step and stamp and by step and flash, the latter a technique that use UV curable resist. We identify current capabilities of the different variations of nanoimprint lithography and provide examples of the fabrication of three-dimensional structures and nanostructures in inorganic sol-gel materials. Finally, an overview of the wide range of applications realized so far by nanoimprint lithography is given.

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Acknowledgments

The authors thank S. Dhuey and E. Wood from The Molecular Foundry at Lawrence Berkeley National Laboratory, D. Resnick from Molecular Imprints and G. Kreindl from EVG Group. The support of the EC-funded project NaPaNIL (Contract no. NMP 214249) is gratefully acknowledged. The content of this work is the sole responsibility of the authors.

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Authors and Affiliations

  1. Abeam Technologies, Castro Valley, CA, USA

    Christophe Peroz

  2. Catalan Institute of Nanotechnology, Barcelona, Spain

    Vincent Reboud & Clivia M. Sotomayor Torres

  3. CEA-LETI-Minatec Grenoble, Grenoble, France

    Vincent Reboud

  4. Catalan Institute for Research and Advanced Studies ICREA, Barcelona, Spain

    Clivia M. Sotomayor Torres

  5. Department of Physics, Universitat Autonoma de Barcelona, Bellaterra (Barcelona), Spain

    Clivia M. Sotomayor Torres

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  1. Christophe Peroz
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  2. Vincent Reboud
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  3. Clivia M. Sotomayor Torres
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Correspondence to Christophe Peroz .

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Editors and Affiliations

  1. , National Research Council of Canada, National Institute for Nanotechnology, Saskatchewan Drive 1142, Edmonton, T6G 2M9, Alberta, Canada

    Maria Stepanova

  2. , Electrical and Computer Engineering, University of Alberta, Edmonton, T6G 2V4, Alberta, Canada

    Steven Dew

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Peroz, C., Reboud, V., Torres, C.M.S. (2012). Nanoimprint Technologies. In: Stepanova, M., Dew, S. (eds) Nanofabrication. Springer, Vienna. https://doi.org/10.1007/978-3-7091-0424-8_5

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