Abstract
A technology platform called LISA (Lateral Integrated Surface Micromachined Accelerometer) is developed for batch fabrication of differential capacitive accelerometers for a, wide range of applications. The novel technology utilizes Deep Reactive Ion Etching (DRIE) of single crystal silicon where the capacitor plates are formed by vertically etching and then releasing the sensing structure by isotropic etch process. The sensing structure is anchored to the substrate by a proprietary oxide isolation technique in which a set of etched trenches are filled with oxide. This novel technology facilitates a high aspect ratio and well controlled plate dimensions.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1999 Springer-Verlag Berlin Heidelberg
About this paper
Cite this paper
Toelg, S., Sooriakumar, K., Loh, Y.H., Sridhar, U., Lau, C.H. (1999). A Novel Technology Platform for Versatile Micromachined Accelerometers. In: Ricken, D.E., Gessner, W. (eds) Advanced Microsystems for Automotive Applications 99. Springer and the environment. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-03838-3_19
Download citation
DOI: https://doi.org/10.1007/978-3-662-03838-3_19
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-662-03840-6
Online ISBN: 978-3-662-03838-3
eBook Packages: Springer Book Archive