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Closing Discussion and Outlook

Chapter
Part of the MatWerk book series (MW)

Abstract

Summarizing, FLA is a powerful and efficient tool for thermal treatment of a variety of materials, ranging from microelectronic to photovoltaic applications. It holds a golden balance between laser and furnace annealing with respect to dopant activation while minimising dopant diffusion. Moreover, being a large area covering annealing tool, FLA saves costs and time. Compared to halogen lamps, which emit light with photon energies mostly below the Silicon bandgap, the UV/Vis spectrum of the flash lamps (cf. Figure 22) also shows the superiority of FLA over conventional thermal treatment.

Keywords

Furnace Annealing Flash Lamp Dopant Diffusion Dopant Activation Golden Balance 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Fachmedien Wiesbaden 2015

Authors and Affiliations

  1. 1.Helmholtz-Zentrum Dresden-Rossendorf e.VDresdenGermany

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