Closing Discussion and Outlook

Chapter
Part of the MatWerk book series (MW)

Abstract

Summarizing, FLA is a powerful and efficient tool for thermal treatment of a variety of materials, ranging from microelectronic to photovoltaic applications. It holds a golden balance between laser and furnace annealing with respect to dopant activation while minimising dopant diffusion. Moreover, being a large area covering annealing tool, FLA saves costs and time. Compared to halogen lamps, which emit light with photon energies mostly below the Silicon bandgap, the UV/Vis spectrum of the flash lamps (cf. Figure 22) also shows the superiority of FLA over conventional thermal treatment.

Keywords

Quartz Furnace Recrystallization Halogen Pyro 

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Copyright information

© Springer Fachmedien Wiesbaden 2015

Authors and Affiliations

  1. 1.Helmholtz-Zentrum Dresden-Rossendorf e.VDresdenGermany

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