Closing Discussion and Outlook
Summarizing, FLA is a powerful and efficient tool for thermal treatment of a variety of materials, ranging from microelectronic to photovoltaic applications. It holds a golden balance between laser and furnace annealing with respect to dopant activation while minimising dopant diffusion. Moreover, being a large area covering annealing tool, FLA saves costs and time. Compared to halogen lamps, which emit light with photon energies mostly below the Silicon bandgap, the UV/Vis spectrum of the flash lamps (cf. Figure 22) also shows the superiority of FLA over conventional thermal treatment.
KeywordsQuartz Furnace Recrystallization Halogen Pyro
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