Abstract
The work described here represents a cooperative experimental effort between Aron Vecht Associates and the US Army Electronics Technology and Devices Laboratory to evaluate the applicability of chemical vapor deposition (CVD) for the fabrication of thin film electroluminescent (TFEL) display devices. Device fabrication and process development have been carried out at Aron Vecht Associates and ETDL has performed some final process steps, device characterization and analysis of the films. Several iterations of fabrication and evaluation have yielded devices comparable to those being produced by conventional methods. Further process development and some inherent advantages of the process could make this an attractive manufacturing approach.
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© 1989 Springer-Verlag Berlin, Heidelberg
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Morton, D.C. et al. (1989). Chemical Vapor Deposition of Thin Films for ACEL. In: Shionoya, S., Kobayashi, H. (eds) Electroluminescence. Springer Proceedings in Physics, vol 38. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-93430-8_48
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DOI: https://doi.org/10.1007/978-3-642-93430-8_48
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-93432-2
Online ISBN: 978-3-642-93430-8
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