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Some Problems of Construction Implied by Requirements of Up-To-Date SIMS Instrumentation

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Secondary Ion Mass Spectrometry SIMS III

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 19))

Abstract

Recent advances in various instrument components and methods for SIMS bring us to the threshold of rapid growth in the application of SIMS. In spite of the present difficulties in quantitative analysis, the extreme sensitivity and promise of sub-micron imaging capability foreshadow its rapid growth in surface and thin film analyses. Here we will examine some of these new methods and components and predict the potential that might be realized in a few years for quadrupole microbeam SIMS instrumentation.

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Author information

Authors and Affiliations

  1. Physical Electronics Division, Perkin-Elmer, Eden Prairie, MN, 55344, USA

    R. L. Gerlach

Authors
  1. R. L. Gerlach
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Editor information

Editors and Affiliations

  1. Physikalisches Institut, Universität Münster, D-4400, Münster, Fed. Rep. of Germany

    A. Benninghoven

  2. Physical Institute of the Technical University, H-1111, Budapest, Hungary

    J. Giber  & J. László  & 

  3. Department of Physical Chemistry and Radiology, Eötvös University, H-1111, Budapest, Hungary

    M. Riedel

  4. Philips Research Laboratories, Eindhoven, The Netherlands

    H. W. Werner

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© 1982 Springer-Verlag Berlin Heidelberg

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Gerlach, R.L. (1982). Some Problems of Construction Implied by Requirements of Up-To-Date SIMS Instrumentation. In: Benninghoven, A., Giber, J., László, J., Riedel, M., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS III. Springer Series in Chemical Physics, vol 19. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-88152-7_2

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  • DOI: https://doi.org/10.1007/978-3-642-88152-7_2

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-88154-1

  • Online ISBN: 978-3-642-88152-7

  • eBook Packages: Springer Book Archive

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