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Positive Photoresist Chemistry

  • M. Murata
  • M. Koshiba
  • Y. Harita
Conference paper

Abstract

The present paper describes chemistry of naphthoquinone diazide (NQD) — novolak type positive photoresists focusing on the reactions of NQD. NQD is a highly reactive compound and has been known to render various kinds of reactions, among which photochemical, thermal and base catalyzed reactions are very important for the positive photoresist chemistry. Upon light exposure it releases nitrogen and undergoes Wolff rearrangement to transform into a ketene, which then reacts with water to produce an acid. This series of well-known reactions is regarded as the principle of pattern formation of the positive photoresist. Recent photochemical works seem focused on revealing more detailed mechanisms and kinetics of the reactions. Thermal and base catalyzed reactions give crosslinked structures to the resist which play important roles in several novel resist processes for improved resist performances such as deep-UV cure, REL, LENOS and DESIRE processes. The present paper elucidates the mechanisms of these processes based on the results of our model experiments on thermal and base catalyzed reactions.

Keywords

Crosslinking Structure Wall Angle Pattern Profile Positive Photoresist Base Catalyze Reaction 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    Murata M, Koshiba M, Harila Y (1989) Proccedings of SPIE 1086:48CrossRefGoogle Scholar
  2. 2.
    Koshiba M, Murala M, Harila Y (1988) ibid 920:364CrossRefGoogle Scholar
  3. 3.
    Sus O (1944) Ann 556:65Google Scholar
  4. 4.
    Pacansky J (1980) Polymer Eng Sci 20:1049CrossRefGoogle Scholar
  5. 5.
    Tanigaki K, Ebbescn TW (1987) J Am Chem Soc 109:5883CrossRefGoogle Scholar
  6. 6.
    Tsuda M, Oikawa S (1989) J Pholopolym Sci Tech 2:325CrossRefGoogle Scholar
  7. 7.
    Delaire JA, Faure J, Hassine-Renou F, Soreau M, Mayeux A (1987) Nouveau Journal de Chimic 11:15Google Scholar
  8. 8.
    Shibala T, Koseki K, Yamaoka T, Yoshizawa M, Uehiki H, Kobayashi T (1988) J Phys Chcm 92:6269CrossRefGoogle Scholar
  9. 9.
    Yates P, Robb EW (1957) J Am Chcm Soc 79:5760CrossRefGoogle Scholar
  10. 10.
    Okuda Y, Ohkuma T, Takashima Y, Miyai Y, Inoue M (1987) Proceedings of SPIE 771:61CrossRefGoogle Scholar
  11. 11.
    Ogawa S, Uoya S, Kimura H, Nagala H (1988) Proceedings of 1st MicroProcess Conference : 162Google Scholar
  12. 12.
    Hiraoka H, Pacansky J (1981) J Electrochem Soc 128:2645CrossRefGoogle Scholar
  13. 13.
    Roland B, Vandendrissche J, Lombaertes R, Denturck B, Jakus C (1988) Proceedings of SPIE 920:120CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1991

Authors and Affiliations

  • M. Murata
    • 1
  • M. Koshiba
    • 1
  • Y. Harita
    • 1
  1. 1.Electronics Research LaboratoryJapan Synthetic Rubber Co., LtdAsao-ku, Kawasaki 215Japan

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