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Photoacoustic, Photothermal and Photochemical Processes at Surfaces and in Thin Films pp 55–87Cite as

Time-of-Flight Analysis of IR and UV Laser-Induced Multilayer Desorption and Ablation

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Part of the book series: Topics in Current Physics ((TCPHY,volume 47))

Abstract

This chapter reports recent results from investigations of multilayer desorption and ablation from molecular van der Waals films by high power IR and UV laser pulses. The information obtained by the time-of-flight technique about the mechanisms involved and about the characteristic features of the induced processes is discussed in detail. Photoablation in the IR and UV spectral regions is compared, to gain insight into wavelength-specific behavior.

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  1. Peter Hess
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  1. Physikalisch-Chemisches Institut der Universität, Im Neuenheimer Feld 253, D-6900, Heidelberg 1, Fed. Rep. of Germany

    Peter Hess

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Hess, P. (1989). Time-of-Flight Analysis of IR and UV Laser-Induced Multilayer Desorption and Ablation. In: Hess, P. (eds) Photoacoustic, Photothermal and Photochemical Processes at Surfaces and in Thin Films. Topics in Current Physics, vol 47. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-83945-0_3

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  • DOI: https://doi.org/10.1007/978-3-642-83945-0_3

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-83947-4

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