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On the Generation of C2-Radicals by IR-Multiple-Photon Dissociation

  • H. Albrecht
  • H. Hohmann
  • R. Grunwald
Conference paper
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 39)

Abstract

In most cases of laser assisted photolytic reactions, for example deposition, etching and doping of electronic materials, the laser was used to dissociate the parent molecules, i.e. to generate free radicals[1]. Among these laser assisted photolytic reactions the IR multiple photon dissociation (IR-MPD) is a powerful technique for the generation of free radicals [2]. In the present paper we give some results concerning the investigation of the production of C2 radicals by IR-MPD of molecules, such as C2H4 and C2H4Cl, with TEA-CO2-laser pulses. The spontaneous and laser induced fluorescence were used to detect the carbon radicals. We have investigated the pressure, excitation wavelength and time dependences of the (relative) concentration of the C2 radicals in the d3πg and a3πu states of the well-known Swan band.

Keywords

Fluorescence Decay Excited Triplet State Rotational Relaxation Intensity Tail Rotational Relaxation Time 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. “Surface Studies with Lasers” (Ed.: F.R. Aussenegg, A. Leitner, M.E. Lippitsch) Springer-Verlag Berlin, Heidelberg, New York, Tokyo (1983).Google Scholar
  2. 2.
    M.R. Levy, H. Reisler, M.S. Mangir, C. Wittig, Optical Engineering 19, 29 (1980).Google Scholar
  3. 3.
    R.V. Ambartzumian, N.V. Chekalin, V.S. Letokhov, E.A. Ryabov, Chem. Phys. Lett. 36, 301 (1975).CrossRefGoogle Scholar
  4. 4.
    J.F. Cabaliero, C. Wittig, J. Chem. Phys. 78, 7169 (1983).CrossRefGoogle Scholar
  5. 5.
    N.V. Chekalin, V.S. Letokhov, V.N. Lokhman, A.N. Shibanov, Chem. Physics 36, 415 (1979).CrossRefGoogle Scholar
  6. 6.
    V.M. Donelly, L. Pasternack, Chem. Physics 39, 427 (1979).CrossRefGoogle Scholar
  7. 7.
    N.V. Chekalin, V.S. Dolzhikov, V.S. Letokhov, V.N. Lokhman, A.N. Shibanov, Appl. Phys. 12, 191 (1977).CrossRefGoogle Scholar
  8. 8.
    J.S. Fransisco, Zhu Qingshi, J.I. Steinfeld, J. Chem. Phys. 78, 5339 (1983).CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1984

Authors and Affiliations

  • H. Albrecht
    • 1
  • H. Hohmann
    • 1
  • R. Grunwald
    • 1
  1. 1.Central Institute of Optics and Spectroscopy of the Academy of Sciences of the GDRBerlin - AdlershofGermany

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