Abstract
Laser annealing has gained much interest in the last few years, and it was first widely thought that this new method would soon be a standard technique in semiconductor processing. This euphoric opinion, however, has to be scaled down to the real possibilities of this new and exciting technique.
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Götzlich, J., Ryssel, H. (1984). Applications of Laser Annealing. In: Bäuerle, D. (eds) Laser Processing and Diagnostics. Springer Series in Chemical Physics, vol 39. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82381-7_7
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DOI: https://doi.org/10.1007/978-3-642-82381-7_7
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