Skip to main content

Melting Model for UV Lasers

  • Conference paper
Laser Processing and Diagnostics

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 39))

Abstract

The thermodynamic model we developed previously for ruby or YAG laser annealing of silicon has been applied to evaluate the melt depths in the same semiconductor under U.V. pulsed laser irradiation.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. D.H. Lowndes et al. Appl. Phys. Lett. 41, 938 (1982)

    Article  CAS  Google Scholar 

  2. C.W. White. Journal de Physique C5-1983, page 145

    Google Scholar 

  3. R.T. Young et al. Sol. State Technology, 26, 183 (1983)

    CAS  Google Scholar 

  4. I.B. Khaibullin et al. Journ. Appl. Phys. 42, 5893 (1971)

    Article  Google Scholar 

  5. P. Baeri et al. Journ. Appl. Phys. 50, 788 (1979)

    Article  CAS  Google Scholar 

  6. A.E. Bell. RCA Review 40, 295 (1979)

    CAS  Google Scholar 

  7. R.F. Wood and G.E. Giles. Phys. Rev. B23, 2923 (1981)

    Google Scholar 

  8. a) M. Toulemonde, R. Heddache, S. Unamuno, P. Siffert, Strasbourg Rapport CRN-CPR 83-18 b) R.O. Bell, M. Toulemonde and P. Siffert, Appl. Phys. 19, 313 (1979) c) M. Toulemonde, S. Unamuno, R. Heddache, M.O. Lambert,Hage-Ali and P. Siffert (to be published)

    Google Scholar 

  9. G.E. Jellison and F.A. Modine, Phys. Rev. B27, 7466 (1983)

    Google Scholar 

  10. A, Daunois and D.E. Aspnes, Phys. Rev. B18, 1824 (1978)

    Google Scholar 

  11. G.E. Jellison and F.A. Modine, J. Appl. Phys. 53, 3745 (1982)

    Article  CAS  Google Scholar 

  12. H.R. Philipp and E.A. Taft, Phys, Rev. 120, 37 (1960)

    Article  CAS  Google Scholar 

  13. H.R. Philipp and H. Ehrenreich, Phys. Rev. 129, 1550 (1963)

    Article  CAS  Google Scholar 

  14. K.M. Shvarev et al. Sov. Phys. Solid State 16, 2111 (1975)

    Google Scholar 

  15. T. Gattuso et al. MIT-EL82-022 page 29

    Google Scholar 

  16. H.C. Weber et al. Appl. Phys. Lett. 43, 669 (1983)

    Article  Google Scholar 

  17. E.P. Donoyan et al. Appl. Phys. Lett. 42, 698 (1983)

    Article  Google Scholar 

  18. R.T. Young et al. IEEE, Electron Devices Letters, EDL-3, 280 (19.82)

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1984 Springer-Verlag Berlin Heidelberg

About this paper

Cite this paper

Unamuno, S., Toulemonde, M., Siffert, P. (1984). Melting Model for UV Lasers. In: Bäuerle, D. (eds) Laser Processing and Diagnostics. Springer Series in Chemical Physics, vol 39. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82381-7_6

Download citation

  • DOI: https://doi.org/10.1007/978-3-642-82381-7_6

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82383-1

  • Online ISBN: 978-3-642-82381-7

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics