Time Resolved Calorimetry of 30 nm Te-Films During Laser Annealing

  • H. Coufal
  • W. Lee
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 39)


The temperature of 30 nm thick Te films has been studied during annealing with a XeCl Excimer laser. Using a pyroelectric thin film calorimeter melting, boiling and recrystallization were observed. Boiling was identified as the prevalent mechanism for the loss of material.


Laser Fluences Vibrational Relaxation Laser Annealing Pyroelectric Coefficient Prevalent Mechanism 
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  1. [1]
    H. Coufal, Appl. Phys. Lett. 44, 59 (1984).CrossRefGoogle Scholar
  2. [2]
    W. Lee and R. Geiss, J. Appl. Phys. 54, 1351 (1983).CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1984

Authors and Affiliations

  • H. Coufal
    • 1
  • W. Lee
    • 1
  1. 1.IBM Research LaboratorySan JoseUSA

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