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The Physics of Ultraviolet Photodeposition

  • H. H. Gilgen
  • C. J. Chen
  • R. Krchnavek
  • R. M. OsgoodJr.
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 39)

Abstract

Ultraviolet photodeposition is a technique for direct laser writing of submicrometer metal patterns on solid substrates. The process involves a wealth of unexplored physical phenomena including micrometer-scale ultraviolet photochemistry and surface and interface chemical dynamics. This paper briefly reviews the current developments in understanding the process physics. In addition, the applications of the technique to microelectronics fabrication are briefly discussed.

Keywords

Parent Molecule Laser Direct Writing Metal Salt Solution Laser Writing Metal Alkyl 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    P.K. Boyer, G.A. Roche, W.H. Ritchie, and G.J. Collins, Appl. Phys. Lett. 40, 716 (1982).CrossRefGoogle Scholar
  2. 2.
    T.F. Deutsch, D.J. Ehrlich and R.M. Osgood, Appl. Phys. Lett. 35, 175 (1979).CrossRefGoogle Scholar
  3. 3.
    D.J. Ehrlich, R.M. Osgood, and T.F. Deutsch, IEEE Journal of Quantum Electronics, 16, 11 (1980).CrossRefGoogle Scholar
  4. 4.
    R.M. Osgood, Ann. Rev. Phys. Chem. 34, 77 (1983).CrossRefGoogle Scholar
  5. 5.
    S.D. Allen and M. Bass, J. Vac. Sci. Technol. 16, 431 (1979).CrossRefGoogle Scholar
  6. 6.
    D. Bäuerle, Proc. Int. Conf. on “Surface Studies with Lasers,” 1983, ed. by F. Aussenegg, et al., Springer, Chem. Phys. 33, 178 (1983)Google Scholar
  7. 7.
    I. P. Herman, R.H. Hyde, B.M. McWilliams, A. H. Weisberg, and L.L. Wood Mat. Res. Soc. Symp. Proc. 17, 9 (1983).CrossRefGoogle Scholar
  8. 8.
    C.J. Chen and R.M. Osgood, J. Chem. Phys. 81, 318; 327 (1984).CrossRefGoogle Scholar
  9. 9.
    C.J. Chen and R.M. Osgood, Chem. Phys. Lett. 98, 363 (1983).CrossRefGoogle Scholar
  10. 10.
    T.H. Wood, J.C. White and B. A. Thacker, Appl. Phys. Lett. 42, 408 (1983).CrossRefGoogle Scholar
  11. 11.
    S.R.J. Brueck and D.J. Ehrlich, Phys. Rev. Lett. 48, 1678 (1982).CrossRefGoogle Scholar
  12. 12.
    H.H. Gilgen, D.V. Podlesnik, C.J. Chen and R.M. Osgood, Mat. Res. Soc. Symp. Proc. 29, (in press), (1984).Google Scholar
  13. 13.
    Zhou Guosheng, P.M. Fauchet and A.E. Siegnann, Phys. Rev. B. 26, 5366 (1982).CrossRefGoogle Scholar
  14. 14.
    D.J. Ehrlich, R.M. Osgood, D.J. Silversmith, and T.F. Deutsch, IEEE Electron Device Lett. EDL-1 (1980).Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1984

Authors and Affiliations

  • H. H. Gilgen
    • 1
  • C. J. Chen
    • 1
  • R. Krchnavek
    • 1
  • R. M. OsgoodJr.
    • 1
  1. 1.Columbia Microelectronics Sciences LaboratoriesColumbia UniversityNew YorkUSA

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