Structure of Platinum and Tin Films Formed by Laser-Induced Chemical Vapor Deposition

Abstract

Working integrated circuits have recently been produced by LCVD techniques (1), and much of the laser chemistry effort at the gas-solid and liquid-solid interfaces is directed towards this goal (2–4). In the present communication we report on the LCVD of Pt and Sn by observing the deposited thin films using electron microscopy. The dependence of the structure of the metallic deposit on the following variables is measured:

• A) The LCVD mechanism which can be either pyrolytic or photolytic.

• B) The laser irradiation time.

• C) The laser power density at the surface.

The dependence of the LCVD on the gas pressure in these experiments has been reported elsewhere (5). In a future paper we will try to correlate the observed structures of the metallic deposits with their electric conductivity (6).