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Improvements in the Routine Depth Profiling of Doping Elements

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Secondary Ion Mass Spectrometry SIMS IV

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 36))

Abstract

In the SIMS depth profiling of doping elements, crater-edge and surrounding influences may still limit the dynamic range [1] , despite the impressing progress that has been achieved in the past [2,3] . In addition, profile deviations may sometimes be caused by residual contamination spots in the crater area.

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References

  1. W.Vandervorst, H.E.Maes, and R.De Keersmaecker, Surf. Interface Anal. 4, 245 (1982)

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  2. C.W.Magee and R.E.Honig, Surf, Interface Anal. 4, 35 (1982)

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  3. K.Wittmaack and J.B.Clegg, Appl. Phys. Lett. 37, 285 (1980)

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  4. K. Wittmaack, Appl. Phys. 12, 149 (1977)

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  5. F.G.Rüdenauer and W.Steiger, Mikrochim. Acta II, 375 (1981)

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Author information

Authors and Affiliations

  1. Siemens AG, Forschungslaboratorien, Otto-Hahn-Ring 6, Müinchen 83, D-8000, Fed. Rep. of Germany

    R. v. Criegern & I. Weitzel

  2. Telemit Electronic GmbH, Heidemannstraße 17, München 45, D-8000, Fed. Rep. of Germany

    J. Fottner

Authors
  1. R. v. Criegern
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  2. I. Weitzel
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  3. J. Fottner
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Editor information

Editors and Affiliations

  1. Phsysikalisches Inst., Universität Münster, Münster, D-4400, Fed. Rep. of Germany

    A. Benninghoven

  2. College of General Education, Osaka University, Osaka 560, Japan

    J. Okano

  3. Department of Applied Physics, Osaka University, Osaka 565, Japan

    R. Shimizu

  4. Philips Research Laboratories, Eindhoven, The Netherlands

    H. W. Werner

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© 1984 Springer-Verlag Berlin Heidelberg

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v. Criegern, R., Weitzel, I., Fottner, J. (1984). Improvements in the Routine Depth Profiling of Doping Elements. In: Benninghoven, A., Okano, J., Shimizu, R., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS IV. Springer Series in Chemical Physics, vol 36. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82256-8_82

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  • DOI: https://doi.org/10.1007/978-3-642-82256-8_82

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82258-2

  • Online ISBN: 978-3-642-82256-8

  • eBook Packages: Springer Book Archive

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