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Influence of Alkali Metals on the Negative Secondary Ion Emission from Silicon

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Secondary Ion Mass Spectrometry SIMS IV

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 36))

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Abstract

The utility of ion implantation to investigate the influence of reactive ions on the secondary ion emission has been demonstrated by COLLIGON and KIRIAKIDES [1] in the case of copper matrix material.

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References

  1. J.S.Colligon and K.Kiriakides: Vacuum 29,357(1979)

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  2. W.Frentrup, M.Griepentrog, and U.Mueller-Jahreis: Phys. Stat. Sol. (a) 79(1983) ( in print )

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  3. V.R.Deline, W.Katz, C.A.Evans, and P.Williams: Appl. Phys. Letters 33,832(1978)

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  4. J.E.Chelgren, W.Katz, V.R.Deline, C.A.Evans, R.J.Blattner, and P.Williams: J. Vac. Sci. Technol. 16,324(1979)

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Author information

Authors and Affiliations

  1. Humboldt-Universität zu Berlin, Sektion Physik, Bereich “Atomstoßprozesse der Festkörperphysik”, Invalidenstraße 42, Berlin, DDR-1040, German Democratic Republic

    W. Frentrup, M. Griepentrog, H. Klose, G. Kreysch & U. Mueller-Jahreis

Authors
  1. W. Frentrup
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  2. M. Griepentrog
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  3. H. Klose
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  4. G. Kreysch
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  5. U. Mueller-Jahreis
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Editor information

Editors and Affiliations

  1. Phsysikalisches Inst., Universität Münster, Münster, D-4400, Fed. Rep. of Germany

    A. Benninghoven

  2. College of General Education, Osaka University, Osaka 560, Japan

    J. Okano

  3. Department of Applied Physics, Osaka University, Osaka 565, Japan

    R. Shimizu

  4. Philips Research Laboratories, Eindhoven, The Netherlands

    H. W. Werner

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© 1984 Springer-Verlag Berlin Heidelberg

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Frentrup, W., Griepentrog, M., Klose, H., Kreysch, G., Mueller-Jahreis, U. (1984). Influence of Alkali Metals on the Negative Secondary Ion Emission from Silicon. In: Benninghoven, A., Okano, J., Shimizu, R., Werner, H.W. (eds) Secondary Ion Mass Spectrometry SIMS IV. Springer Series in Chemical Physics, vol 36. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82256-8_12

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  • DOI: https://doi.org/10.1007/978-3-642-82256-8_12

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-82258-2

  • Online ISBN: 978-3-642-82256-8

  • eBook Packages: Springer Book Archive

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