Abstract
Pulsed UV laser doping of silicon has been shown to yield high levels of activated dopant for a variety of implant depths and dopant concentrations. The technique combines the rapid thermal cycling times found in pulsed laser annealing, with the localised in situ generation of dopant species by pyrolysis and photolysis of precursors to allow one-step fabrication of p-n devices [1,2]. We have now demonstrated single-step doping of silicon with boron and phosphorus to form p- and n-type material; and performed initial experiments on overdoping to produce npn or pnp trilayer structures.
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References
K.G.Ibbs and M.L.Lloyd UV laser doping of silicon Optics and Laser Technology, 15, p.35, (1983)
T.Deutsch, J.Fan, G.Turner, R.Chapman, D.Ehrlich, R.Osgood Efficient Si solar cells by laser photochemical doping Appl. Phys. Lett, 38 (3), p. 144, (1981)
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K.G.Ibbs and M.L.Lloyd Characteristics of laser implantation/doping Materials Res. Soc., November 1982 Proc.of “Laser diagnostics and photochemical processing for semiconductor devices”,To be published by Elservier 1983
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© 1983 Springer-Verlag Berlin Heidelberg
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Ibbs, K., Lloyd, M.L. (1983). Laser Doping of Silicon by the Dissociation of Metal Alkyls. In: Aussenegg, F.R., Leitner, A., Lippitsch, M.E. (eds) Surface Studies with Lasers. Springer Series in Chemical Physics, vol 33. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-82085-4_30
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DOI: https://doi.org/10.1007/978-3-642-82085-4_30
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