Surface Second Harmonic Generation from the Si/SiO2 Interface Using 10 fs Pulses

  • S. T. Cundiff
  • F. H. Baumann
  • W. H. Knox
  • K. W. Evans-Lutterodt
  • M.-T. Tang
  • H. M. van Driel
Conference paper
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 62)

Abstract

Surface second harmonic generation from the Si(100)/SiO2 interface is measured using 10 fs pulses. The dependence of the oscillation amplitudes as a function of azimuthal angle on miscut and surface roughness is examined.

Keywords

Quartz SiO2 Sapphire 

References

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Copyright information

© Springer-Verlag Berlin Heidelberg 1996

Authors and Affiliations

  • S. T. Cundiff
    • 1
  • F. H. Baumann
    • 1
  • W. H. Knox
    • 1
  • K. W. Evans-Lutterodt
    • 2
  • M.-T. Tang
    • 2
  • H. M. van Driel
    • 3
  1. 1.Bell LaboratoriesLucent TechnologiesHolmdelUSA
  2. 2.Bell LaboratoriesLucent TechnologiesMurray HillUSA
  3. 3.Department of PhysicsUniversity of TorontoTorontoCanada

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