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Surface Second Harmonic Generation from the Si/SiO2 Interface Using 10 fs Pulses

  • S. T. Cundiff
  • F. H. Baumann
  • W. H. Knox
  • K. W. Evans-Lutterodt
  • M.-T. Tang
  • H. M. van Driel
Conference paper
Part of the Springer Series in Chemical Physics book series (CHEMICAL, volume 62)

Abstract

Surface second harmonic generation from the Si(100)/SiO2 interface is measured using 10 fs pulses. The dependence of the oscillation amplitudes as a function of azimuthal angle on miscut and surface roughness is examined.

Keywords

Azimuthal Angle Harmonic Generation Oxide Thickness Bell Laboratory Interface Width 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

References

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Copyright information

© Springer-Verlag Berlin Heidelberg 1996

Authors and Affiliations

  • S. T. Cundiff
    • 1
  • F. H. Baumann
    • 1
  • W. H. Knox
    • 1
  • K. W. Evans-Lutterodt
    • 2
  • M.-T. Tang
    • 2
  • H. M. van Driel
    • 3
  1. 1.Bell LaboratoriesLucent TechnologiesHolmdelUSA
  2. 2.Bell LaboratoriesLucent TechnologiesMurray HillUSA
  3. 3.Department of PhysicsUniversity of TorontoTorontoCanada

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