Barrier-Properties of All-Niobium Tunnel Junctions
The barrier-region of all-niobium tunnel junctions has been imaged by means of high resolution transmission electron microscopy (atomic scale). Amorphous silicon barriers as well as amorphous Al2O3-barriers have been studied. Different behaviour concerning wetting and roughness have been found. Finally the TEM-data are correlated with the transport properties of the barriers.
KeywordsHigh Resolution Transmission Electron Microscopy Leakage Current Josephson Junction Tunnel Junction Ground Electrode
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