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High-Quality Microcrystalline SiC Films Fabricated by the Controlled Plasma Magnetron Method

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Amorphous and Crystalline Silicon Carbide II

Part of the book series: Springer Proceedings in Physics ((SPPHY,volume 43))

Abstract

This paper describes our investigations on high-efficiency a-Si solar cells and high-quality microcrystalline ( μc) SiC films fabricated by the CPM (Controlled Plasma Magnetron) method.

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References

  1. Y. Tawada, Y. Hamakawa, et al., Proc. 15th IEEE Photovol. Spec. Conf., (1981) 245

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Author information

Authors and Affiliations

  1. Functional Materials Research Center, SANYO Electric Co., Ltd., 1-18-13, Hashiridani, Hirakata City, Osaka, Japan

    M. Nishikuni, H. Dohjoh, K. Ninomiya, N. Nakamura, T. Matsuoka, S. Tsuda, S. Nakano, M. Ohnishi & Y. Kuwano

Authors
  1. M. Nishikuni
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  2. H. Dohjoh
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  3. K. Ninomiya
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  4. N. Nakamura
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  5. T. Matsuoka
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  6. S. Tsuda
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  7. S. Nakano
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  8. M. Ohnishi
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  9. Y. Kuwano
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Editor information

Editors and Affiliations

  1. Microelectronics Laboratory, Santa Clara University, Santa Clara, CA, 95053, USA

    Mahmud M. Rahman  & Cary Y.-W. Yang  & 

  2. Materials Science Research Center of Excellence, Howard University, 2300 6th Street N.W., Washington, DC, 20059, USA

    Gary L. Harris

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© 1989 Springer-Verlag Berlin, Heidelberg

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Nishikuni, M. et al. (1989). High-Quality Microcrystalline SiC Films Fabricated by the Controlled Plasma Magnetron Method. In: Rahman, M.M., Yang, C.YW., Harris, G.L. (eds) Amorphous and Crystalline Silicon Carbide II. Springer Proceedings in Physics, vol 43. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-75048-9_11

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  • DOI: https://doi.org/10.1007/978-3-642-75048-9_11

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-75050-2

  • Online ISBN: 978-3-642-75048-9

  • eBook Packages: Springer Book Archive

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