Abstract
As a prototype of insulator-semiconductor interfaces, the epitaxial growth of CaF2 on silicon is of much interest from both theoretical and experimental point of view. The high degree of lattice matching between the fluorite structure CaF2 and the diamond structure Si crystal makes the growth of high quality crystalline epiiayers possible. Recently a number of experimental studies [1–5] have been devoted to properties of the interface, however, theoretical studies on microscopic structure of the interface CaF2/Si(111) are still relatively scarce.
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References
T. Asano, H. Ishiwara: Appi. Phys. Lett. 42, 517 (1983)
R. W. Fathauer, L. J. Schowalter: Appi. Phys. Lett. 41 519 (1984)
F. J. Himspel, F. U. Hillobreeht, G. Hughes, J. L. Jordan, U. O. Karlsson, F. R. MeFeely, J. F. Morar, D. Rieger: Appi Phys. Lett., 48, 596 (1984)
L. J. Schowalter, R. W. Fathauer, R. P. Goehner, L. G. Turner, R. W. DeBlois, S. Hashimoto, J. L. Peng, W. M. Gibson, J. P. Krusius: J. Appi. Phys. 58(1), 302 (1985)
M. A. Olmstead, R. I. G. Uhrberg, R. D. Birngans, R. Z. Bachrach: J. Vac. Sci. Technol., B4 (4) 1123 (1986)
M. A. Olmstead, R. I. G. Uhrberg, R. D. Bringans, R. Z. Bachrach: Phys. Rev. B35(14). 7526 (1987)
D. Rieger, F. J. Himpsel, U. O. Karlsson, F. R. MeFeely, J. F. Morar, J. A. Yarmaff: Phys. Rev. B34(10). 7295 (1986)
J. R. Chelikowsky, M. L. Cohen: Phys. Rev. B10, 5095 (1974)
R. A. Heaton, C. C. Lin: Phys. Rev. B22, 3629 (1980)
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Kaiming, Z., Zengju, T., Xide, X. (1988). Preliminary Studies on the Interface Structures of CaF2/Si(111). In: de Wette, F.W. (eds) Solvay Conference on Surface Science. Springer Series in Surface Sciences, vol 14. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-74218-7_21
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DOI: https://doi.org/10.1007/978-3-642-74218-7_21
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