Abstract
We report measurements of the optical breakdown threshold and ablation depth in dielectrics for laser pulse durations between 5 ps and 5 fs at the Ti:sapphire wavelength. The application of the shortest pulses leads to sub-μm ablation rates, smooth morpholgies of the generated structures and reduces the statistical behaviour of material removal. With 5-fs pulses a light intensity of 1014 W/cm2 can be applied to fused silica without causing damage
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© 1998 Springer-Verlag Berlin Heidelberg
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Lenzner, M., Sartania, S., Spielmann, C., Krausz, F., Krüger, J., Kautek, W. (1998). Nanometer precision material ablation and optical breakdown with sub-10 fs pulses. In: Ultrafast Phenomena XI. Springer Series in Chemical Physics, vol 63. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-72289-9_95
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DOI: https://doi.org/10.1007/978-3-642-72289-9_95
Publisher Name: Springer, Berlin, Heidelberg
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Online ISBN: 978-3-642-72289-9
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