Skip to main content
SpringerLink
Log in

Microwave-Plasma Deposition of Diamond

  • Chapter
Low-Pressure Synthetic Diamond

Part of the book series: Springer Series in Materials Processing ((SSMATERIALSPROC))

Abstract

Microwave-plasma enhanced chemical vapor deposition (MPECVD) is among the most widely used techniques for diamond growth from the gas phase. From its inception in the early 1980s [2.1], the technique has found a lot of success because of its simplicity, flexibility, and the early commercial availability of reactors from New Japan Radio Corporation based on the NIRIM (National Institute for Research in Inorganic Materials) work. The reactor developed at NIRIM consisted of an evacuated quartz tube which was inserted through a waveguide. A hydrogen-methane plasma was formed inside the tube and was used to create the proper gas chemistry for diamond growth. Research programs that used this technique flourished in Japan, and the first attempt at a production unit using NIRIM type reactors was made [2.2].

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Log in via an institution
Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 84.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. M. Kamo, Y. Sato, S. Matsumoto, and N. Setaka, J. Cryst. Growth 62, 642 (1983)

    Article  ADS  Google Scholar 

  2. P.K. Bachmann and R.F. Messier, Chem Eng News 67(20), 24 (1989)

    Article  Google Scholar 

  3. P.K. Bachmann, W. Drawl, D. Knight, R. Weimer, and R.F. Messier, in Diamond and Diamond-like Materials, ed. A. Badzian, M. Geis, and G. Johnson, MRS Symposium Proceedings, Vol. EA-15, p. 99 (1988)

    Google Scholar 

  4. S. Yugo, T. Kimura, and T. Muto, Vacuum 41, 1364 (1990)

    Article  Google Scholar 

  5. X. Jiang and C.P. Klages, Diamond Rel. Mater. 2(5–7), 1112 (1993)

    Article  Google Scholar 

  6. B.R. Stoner and J.T. Glass, Appl. Phys. Lett. 60, 698 (1992)

    Article  ADS  Google Scholar 

  7. B.A. Fox, M.L. Hartsell, D.M. Malta, H.A. Wynands, C.-T. Kao, L.S. Piano, G.J. Tessmer, R.B. Henard, J.S. Holmes, A.J. Tessmer, and D.L. Dreifus, Diamond Rel. Mater. 4, 622 (1995)

    Article  Google Scholar 

  8. CVD Diamond. Thermal Management Substrates. Optical Windows. Protective Coatings Product Handbook, GEC-Marconi Materials Technology, Caswell, Towcester, Northamptonshire, England (1995)

    Google Scholar 

  9. C. Willingham, T. Hartnett, C. Robinson, and C. Klein, in Applications of Diamond Films and Related Materials, ed. Y. Tzeng, M. Yoshikawa, M. Murakawa, and A. Feldman, Materials Science Monographs, 73, Elsevier, Amsterdam (1991)

    Google Scholar 

  10. C.B. Willingham, Thomas M. Hartnett, Richard P. Miller, and Robert B. Hallock, Proc. SPIE, Vol. 3060, Window and Dome Technologies and Materials V (1997)

    Google Scholar 

  11. J.A. Savage, C.J.H. Wort, C.S.J. Pickles, R.S. Sussmann, C.G. Sweeney, M.R. McClymont, J.R. Brandon, C.N. Dodge, and A.C. Beale, Proc. SPIE, Vol. 3060, Window and Dome Technologies and Materials V (1997), p. 144

    Article  ADS  Google Scholar 

  12. R.S. Sussmann, C.J. Wort, C.G. Sweeney, J.L. Collins, C.N. Dodge, and J.A. Savage, Proc. SPIE, Vol. 2886, Window and Dome Technologies and Materials IV, ed. P. Klocek(1994),p.289

    Google Scholar 

  13. J.E. Graebner, T.M. Hartnett, and R.P. Miller, Appl. Phys. Lett. 64, 2549 (1994)

    Article  ADS  Google Scholar 

  14. E. Hyman, K. Tsang, I. Lottati, A. Drobot, B. Lane, R. Post, and H. Sawin, Surf. Coat. Technol. 49, 387 (1991)

    Article  Google Scholar 

  15. E. Hyman, K. Tsang, A. Drobot, B. Lane, J. Casey, and R. Post, J. Vac. Sci. Technol. A 12, 1474 (1994)

    ADS  Google Scholar 

  16. M. Capitelli, G. Colonna, K. Hassouni, and A. Gicquel, Plasma Chem. Plasma Process. 16, 153 (1996)

    Article  Google Scholar 

  17. K. Hassouni, S. Farhat, CD. Scott, and A. Gicquel, J. Phys. III 6, 1229 (1996)

    Google Scholar 

  18. N.A. Krall and A.W. Trivelpiece, Principles of Plasma Physics, McGraw-Hill, New York (1973)

    Google Scholar 

  19. S.C. Brown, Basic Data of Plasma Physics, M.I.T. Press, Cambridge, MA (1959)

    Google Scholar 

  20. Dieter M. Gruen, Chris D. Zuiker, Alan R. Krauss, and Xianzheng Pan, J. Vac. Sci. Technol. A 13, 1628 (1995)

    ADS  Google Scholar 

  21. P.K. Bachmann, D. Leers, and H. Lydtin, Diamond Rel. Mater. 1, 1 (1991)

    Article  Google Scholar 

  22. Chia-Fu Chen, Sheng-Hsiung Chen, Hsien-Wen Ko, and S.E. Hsu, Diamond Rel. Mater. 3, 443 (1994)

    Article  Google Scholar 

  23. P.A. Rizzi, Microwave Engineering, Prentice Hall, Englewood Cliffs, New Jersey (1988)

    Google Scholar 

  24. A.D. MacDonald, Microwave Breakdown in Gases, John Wiley, New York (1966)

    Google Scholar 

  25. A. Hatta, T. Yara, H. Makita, M. Yuasa, J. Suzuki, Y. Mon, T. Ito, T. Sasaki, and A. Hiraki, Diamond Films Technol. 5, 29 (1995)

    Google Scholar 

  26. C.R. Eddy Jr., B.D. Sartwell, and D.L. Youchison, Surf. Coat. Technol. 48, 69 (1991)

    Article  Google Scholar 

  27. D.K. Smith, E. Sevillano, M. Besen, V. Berkman, and L. Bourget, Diamond Rel. Mater. 1, 814 (1992)

    Article  Google Scholar 

  28. J.C. Angus, F.A. Buck, M. Sunkara, T.F. Groth, C.C. Hayman, and R. Gat, MRS Bull, p. 38, October 1989

    Google Scholar 

  29. N. Ohtake, H. Tokura, Y. Kuriyama, Y. Mashimo, and M. Yoshikawa, Proceedings of the First International Symposium on Diamond and Diamond-Like Films, ed. J.P. Dismukes, A.J. Purdes, K.E. Spear, B.S. Meyerson, K.V. Ravi, T.D. Moustakas, and M. Yoder, Proceedings Vol. 89–12, The Electrochemical Society, NJ (1989) p. 93

    Google Scholar 

  30. Y. Hirose, Proceedings of the First International Conference on the New Diamond Science and Technology, Tokyo, Japan, October 24–26, 1988

    Google Scholar 

  31. E. Sevillano, L.P. Bourget, and R.S. Post, High Growth Rate Plasma Diamond Deposition and Method of Controlling Same, US Patent 5, 518, 759 (1996)

    Google Scholar 

  32. M.M. Besen, E. Sevillano, and D.K. Smith, Microwave Plasma Reactor, US Patent 5, 556, 475 (1996)

    Google Scholar 

  33. B. Nagy, Fourth International Conference on CVD Diamond & DLC Coatings and Thick Film Markets, Gorham Advanced Materials Institute, Atlanta, GA, March 11–13, 1996

    Google Scholar 

  34. K.J. Gray and P.M. Fabis, Diamond Rel. Mater. 6, 191 (1997)

    Article  Google Scholar 

  35. ASI Applied Systems, Millersville, MD, Product Data Sheets for DuraSamplIR™ and Comp™ Probes, (1996, 1997)

    Google Scholar 

  36. K. Okano, S. Koizumi, S.R.P. Silva, and G.A.J. Amaratunga, Nature 381, 140 (1996)

    Article  ADS  Google Scholar 

  37. M.D. Whitfield, R.D. McKeag, L.Y.S. Pang, S.S.M. Chan, and R.B. Jackman, Diamond Rel. Mater. 5, 829 (1996)

    Article  Google Scholar 

  38. J.L. Davidson, D. Wur, and W.P. Kang, Proceedings of the Third International Symposium on Diamond Materials, ed. J.P. Dismukes and K.V. Ravi, Proceedings, Vol. 93–17, The Electrochemical Society, NJ (1993) p. 1048

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Applied Science and Technology, Inc. (ASTeX), 35 Cabot Road, Woburn, MA, 01801, USA

    Evelio Sevillano

Authors
  1. Evelio Sevillano
    View author publications

    You can also search for this author in PubMed Google Scholar

Editor information

Editors and Affiliations

  1. Fraunhofer-Institut für Angewandte Festkörperphysik, Tullastrasse 72, D-79108, Freiburg, Germany

    Bernhard Dischler  & Christoph Wild  & 

Rights and permissions

Reprints and permissions

Copyright information

© 1998 Springer-Verlag Berlin Heidelberg

About this chapter

Cite this chapter

Sevillano, E. (1998). Microwave-Plasma Deposition of Diamond. In: Dischler, B., Wild, C. (eds) Low-Pressure Synthetic Diamond. Springer Series in Materials Processing. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-71992-9_2

Download citation

  • DOI: https://doi.org/10.1007/978-3-642-71992-9_2

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-71994-3

  • Online ISBN: 978-3-642-71992-9

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics

Search

Navigation