Emittance Measurements on an Indirectly Heated Heavy-Ion Source

Abstract

Heavy ion sources with indirectly heated cathode are preferred in many cases because of their long lifetime and because of the ease with which the extracted ion current can be stabilised. But the stability of the beam is only one of the important parameters; the uniformity of the dose implanted into the wafers strictly depends on the shape of the ion beam as well. The shape of the beam, i.e. its radius and angle on the target, is a function of the same parameters at the source. This function can be characterised by the emittance of the beam.