A New Facility for Ion Beam Surface Analysis
The surface analysis facility on the 2 MeV Van de Graaff accelerator at the University of Surrey is described. Two beam lines, including a microbeam capability, are dedicated to this application and the target chambers house 2- and 3-axis goniometers and linear drives for rapid sample changing. Rutherford backscattering and PIXE techniques may be combined with ion channelling for the analysis of semiconductor, metal, insulator and biological samples. Data is processed and stored on a DEC LSI 11-03 computer, which is linked to main frame computers with software for data interpretation.
KeywordsBeam Line Rutherford Backscatter Target Chamber Implantation Damage Backscatter Spectrum
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