A New Facility for Ion Beam Surface Analysis
The surface analysis facility on the 2 MeV Van de Graaff accelerator at the University of Surrey is described. Two beam lines, including a microbeam capability, are dedicated to this application and the target chambers house 2- and 3-axis goniometers and linear drives for rapid sample changing. Rutherford backscattering and PIXE techniques may be combined with ion channelling for the analysis of semiconductor, metal, insulator and biological samples. Data is processed and stored on a DEC LSI 11-03 computer, which is linked to main frame computers with software for data interpretation.
Unable to display preview. Download preview PDF.
- 2.J.F. Ziegler: New Uses of Ion Accelerators, Plenum Press, New York, 1975.Google Scholar
- 3.J.W. Mayer, E. Rimini: Ion Beam Handbook for Material Analysis, Acad. Press, London, 1977.Google Scholar
- 4.Edwards High Vacuum, Manor Royal, Crawley, Sussex, England.Google Scholar
- 5.Panmure Instruments Ltd., Bone Lane Industrial Estate, Newbury, Berks, England.Google Scholar
- 7.P.L.F. Hemment, J.F. Singleton and K.G. Stephens: Thin Solid Films, 1975.Google Scholar
- 9.M. Calderon Ltd., Sebastian House, Sebastian Street, London EC1V OHN.Google Scholar
- 10.Portescap (UK) Ltd., 204 Elgar Road, Reading, Berks, England.Google Scholar
- 12.D.W. Wellby, Internal Report, University of Surrey, 1981.Google Scholar
- 13.J. Morris, to be published.Google Scholar
- 14.P.L.F. Hemment, E.A. Maydell-Ondrusz, K.G. Stephens, J. Ioannou, J. Butcher, J. Alderman, IBMM 82, Grenoble 1982.Google Scholar
- 16.M. Tolson, private communication.Google Scholar