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Insulating Films on Semiconductors pp 208–218Cite as

Deposition Technology of Insulating Films

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Part of the book series: Springer Series in Electrophysics ((SSEP,volume 7))

Abstract

This article treats deposition techniques used for secondary passivation. Secondary passivation refers to oxide layers, nitride layers and glass films which cover either the first passivation layer or the conductive interconnection levels.

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Author information

Authors and Affiliations

  1. Siemens Research Laboratories, Otto-Hahn-Ring 6, D-8000, München 83, Fed. Rep. of Germany

    E. Doering

Authors
  1. E. Doering
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Editor information

Editors and Affiliations

  1. Institut für Angewandte Physik, Universität Erlangen-Nürnberg, Glückstraße 9, D-8520, Erlangen, Fed. Rep. of Germany

    Max J. Schulz  & Gerhard Pensl  & 

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© 1981 Springer-Verlag Berlin Heidelberg

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Doering, E. (1981). Deposition Technology of Insulating Films. In: Schulz, M.J., Pensl, G. (eds) Insulating Films on Semiconductors. Springer Series in Electrophysics, vol 7. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-68247-6_33

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  • DOI: https://doi.org/10.1007/978-3-642-68247-6_33

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-68249-0

  • Online ISBN: 978-3-642-68247-6

  • eBook Packages: Springer Book Archive

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