Abstract
Plasma expansion from a hot and dense source, where electric or electromagnetic energy is dissipated, to a low pressure environment, is a very general physical phenomenon which concerns a large variety of objects and covers a broad range of dimensions. The physical issues addressed are relevant to many subjects in science ranging from astrophysical objects [1,2], like supernovae and solar flares, to small laser spots [3-7] and cathode spots [8] (as in vacuum arc). On intermediate scale, it also includes expansion from thermal plasma sources (DC, RF, microwave torches) for plasma chemistry [9-11], as well as divertor region of Tokamak plasmas [12]. Applications of high density plasmas are laser plasma cutting, welding, heating, and annealing [9], and the generation of VUV and X-ray radiation [13]. For the latter two applications, a high temperature, multiple ionization, and high (laser) power densities are required. Laser produced plasmas are also projected to create modulated plasmas for plasma based free electron lasers. Finally in (vacuum) arc switching, the conductive properties of high density plasmas are used
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References
Beams and Jets in Astrophysics, edited by P.A. Hugues (Cambridge University, Cambridge, England, 1991).
J.M. Shull and C.F. McKee, Ap. J. 227, 131 (1979).
J.C.Miller, R.F.Haglund, Laser ablation and desorption, Experimental Methods in Physical Sciences (Academic Press, San Diego, 1998), vol. 30.
Yu. P. Raizer and D.C. Smith, J. Opt. Soc. Am. 70, 258 (1980).
Yu. P. Raizer, Sov. Phys. Usp. 23, 789 (1980).
A. Lebéhot and R. Campargue, Phys. Plasmas 3, 2502 (1996).
J.M. Girard, A. Lebéhot, and R. Campargue, J. Phys. D 26, 1382 (1993).
E. Hantzsche, Contr. Plasma Phys. 30, 575 (1990).
M.I. Boulos, P. Fauchais, and E. Pfender, Thermal Plasmas, Fundamental and Applications (Plenum Press, 1994), Vol. 1-2.
S.M.Aithal, V.V.Subramaniam, and V.Babu, Plasma Chem. Plasma Proc. 19, 487 (1999).
M.C.M. van de Sanden, J.M. de Regt, and D.C. Schram, Plasma Sources Sci. Technol. 3, 501 (1994).
J. Wesson, Tokamaks (Clarendon Press, Oxford, 1997).
A. McPherson, B.D. Thompson, A.B. Borisov, K. Boyer, and C.K. Rhodes, Nature 370, 631 (1994).
H. Askenas and F.S. Sherman, in Rarefied Gas Dynamics, edited by J.H. Leeuw (Academic Press, New York, 1966), vol. 2, p. 84.
Atomic and Molecular Beam Methods, edited by G. Scoles (Oxford University Press, New York, Oxford, 1988, 1992).
B.B. Hamel and D.R. Willis, Phys. Fluids 9, 829 (1966).
E.P. Muntz, B.B. Hamel, and B.L. Maguire, AIAA J. 8, 1651 (1970).
H.C.W. Beijerinck, R.J.F avn Gerwen, E.R.T. Kerstel, J.F.M. Martens, E.J.W. van Vliembergen, M.R.Th. Smits, and G.H. Kaashoek, Chem. Phys. 96, 153 (1985).
R. Campargue, J. Phys. Chem. 88, 4466 (1984).
J.M. Girard, Etude d’un jet supersonique de plasma entretenu par laser, Ph.D. Thesis, in french, (University of Paris-sud, Orsay, 1994).
S.C. Snyder, A.B. Murphy, D.L. Hofeldt, and L.D. Reynolds, Phys. Rev. E 52, 2999 (1995).
A.B. Murphy, J. Phys. D: Appl. Phys. 27, 1492 (1994).
R.B. Fraser, F. Robben, and L. Talbot, Phys. Fluids 14, 2317 (1971).
M.C.M. van de Sanden, R. van den Bercken, and D.C. Schram, Plasma Sources Sci. Technol. 3, 511 (1994).
H.J.G. Gielen, On the electric and magnetic field generation in expanding plasmas, Ph.D. Thesis (Eindhoven University of Technology, Eindhoven, 1989).
C.T. Rettner and D.J. Auerbach, J. Chem. Phys. 104, 2732 (1996).
S. Mazouffre, M.G.H. Boogaarts, J.A.M. van der Mullen, and D.C. Schram, Phys. Rev. Lett. 84, 2622 (2000).
D.C.Schram, I.J.M.M. Raaijmakers, B. van der Sijde, H.J.W. Schenke-laars, P.W.J.M. Boumans, Spectrochimica Acta 38B, 3369 (1992).
M.C.M. van de Sanden, R.J. Severens, W.M.M. Kessels, R.F.G. Meulenbroeks , D.C. Schram, J. Appl. Phys. 84, 2426 (1998).
J.A.M. van der Mullen, Physics Reports 191, 109 (1990).
G. Dinescu, O. Maris, G. Musa, Contrib. Plasma Phys. 31, 49 (1991).
L. Landau and E. Liftshitz, Fluid Mechanics (Pergamon Press, London, 1989).
K.T.A.L. Burm, W.J. Goedheer, D.C. Schram, Phys. Plasmas 6, 2622 (1999).
S.C. Snyder and R.E. Bentley, J. Phys. D: Appl. Phys. 29, 3045 (1996).
M.C.M. van de Sanden, J.M. de Regt, and D.C. Schram, Phys. Rev. E 47, 2792 (1993).
H.M. Mott-Smith, Phys. Rev. 82, 885 (1951).
S.C. Snyder, L.D. Reynolds, G.D. Lassahn, J.R. Fincke, C.B. Shaw Jr., and R.J. Kearney, Phys. Rev. E 47, 1996 (1993).
J. Panda and R.G. Seasholtz, Phys. Fluids 11, 3761 (1999).
L.M. Cohen and R.K. Hanson, J. Phys. D: Appl. Phys. 25, 339 (1992).
Z. Szymansky, Z. Peradzynski, J. Kurzyna, J. Hoffman, M. Dudeck, M. de Graaf, and V. Lago, J. Phys. D: Appl. Phys. 30, 998 (1997).
J.R. Fincke, W.D. Swank, S.C. Snyder, and D.C. Haggard, Rev. Sci. Instrum. 64, 3585 (1993).
M. Rahmane, G. Soucy, and M.I. Boulos, Rev. Sci. Instrum. 66, 3424 (1995).
O. Chazot, J. Gomes, and M. Carbonaro, AIAA TP 98, 2478 (1998).
B. Porterie, M. Larini, and J.C. Loraud, J. Therm. Heat. Transfer 8, 385 (1994).
R.F.G. Meulenbroeks, A.J. van Beek, A.J.G. van Helvoort, M.C.M. van de Sanden, and D.C. Schram, Phys. Rev. E 49, 4397 (1994).
A.J.M. Buuron, D.K. Otorbaev, M.C.M. van de Sanden, and D.C. Schram, Phys. Rev. E 50, 1383 (1994).
R.F.G Meulenbroeks; R.A.H. Engeln, C. Box, I. de Bari, M.C.M. van de Sanden, J.A.M van der Mullen, and D.C. Schram, Phys. Plasmas 2, 1002 (1995).
M.J. de Graaf, R. Severens, R.P. Dahiya, M.C.M. van de Sanden, and D.C. Schram, Phys. Rev. E 48, 2098 (1993).
R.F.G. Meulenbroeks, R.A.H. Engeln, and D.C. Schram, Phys. Rev. E 53, 5207 (1996).
R.F.G. Meulenbroeks, D.C. Schram, M.C.M. van de Sanden, and J.A.M. van der Mullen, Phys. Rev. Lett. 76, 1840 (1996).
A. Lebéhot, J. Kurzyna, V. Lago, M. Dudeck, and M. Nishida, Phys. Plasmas 6, 4750 (1999).
B. Gordiets, CM. Ferreira, J. Nahorny, D. Pagnon, M. Touzeau, and M Vialle, J. Phys. D: Appl. Phys. 29, 1021 (1996).
R.W. Bickes Jr., H.R. Newton, J.M. Herrmann, and R.B. Bernstein, J. Chem. Phys. 64, 3648 (1976).
L. Robin, P. Vervish, and B.G. Cheron, Phys. Plasmas 1, 444 (1994).
M. Rutigliano, G.D. Billing, and M. Cacciatore, in Rarefied Gas Dynamics, edited by R. Brun, R. Campargue, R. Gatignol, J.-C. Leugrand , (Cépadués Edition, Toulouse, 1999), vol. 1, p. 365.
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Schram, D., Mazouffre, S., Engeln, R., van de Sanden, M. (2001). The Physics of Plasma Expansion. In: Campargue, R. (eds) Atomic and Molecular Beams. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-56800-8_14
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DOI: https://doi.org/10.1007/978-3-642-56800-8_14
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