Zusammenfassung
Die laserchemische Abscheidung von Festkörpern aus der Gasphase kann unmittelbar in der Gasphase und auf einer Festkörperoberfläche erfolgen. Im ersten Fall, der Gasphasennukleation, bilden sich feine Pulver. Ihre mittlere Teilchengröße kann im sub-μm-Bereich liegen. Sie werden dann auch Nanopulver genannt (Abschn. 6.1). Im zweiten Fall der Gasphasenabscheidung werden in der Gasphase oder auf der bestrahlten Oberfläche Spezies gebildet, welche auf dem vorhandenen Festkörper eine neue Oberflächenschicht bilden (Abschn. 6.2). Je nach Art der chemischen Ausgangsverbindungen und Prozeßbedingungen können amorphe oder kristalline Schichten entstehen, in chemisch reiner Form oder als Gemische. Zu den chemischen Elementen, welche alle genannten Arten der Gasphasenabscheidung zeigen, gehört das Silizium. Ausgehend von Siliziumwasserstoffen ist es möglich, Siliziumpulver sowie amorphe und kristalline Siliziumschichten zu erzeugen. Daher bietet sich neben anderen das Siliziumwasserstoffsystem für direkte Verfahrensvergleiche an.
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Literatur
Tam, A., G. Moe und W. Happer, Particle Formation by Resonant Laser Light in Alkali-Metal Vapor, Phys.Rev.Lett. 35 (1975) 1630–1633 sowie Happer, W., Opt.Commun. 18 (1976) 93
Ernst, K., Laser snow, chemistry, kinetics, applications, in “Photon-assisted collisions and related topics”, Herausg. N.K. Rahman et al., Chur 1982, S. 321–341
Gianinoni, I. und M. Musci, Laser Materials Production, Nucl.Instr.Methods Phys. Res. A 239 (1985) 406–413 sowie Curcio, F., G. Ghiglione, M. Musci und C. Nannetti Synthesis of Silicon Carbide Powders by a cw CO2 Laser, Appl.Surf Sci. 36 (1989) 52–58
Borsella, E. und R. Fantoni, Synthesis and Characterization of Laser Driven Powders, pres. at Workshop on Emerging Technologies, Cargese, May 4–8, 1987, ENEA Report RT/TIB/87/25; ISSN/0393–6333 sowie Borsella, E., L. Caneve und R. Fantoni Pulsed CO, Laser Driven Production of Si, Si3N4 and SiC Powders, ENEA Report RT/TIB/87/26
Suyama, Y., R.M. Marra, J.S. Haggerty und H. K. Bower, Synthesis of Ultrafine SiC Powders by Laser Driven Gas Phase Reactions, Am.Ceram.Soc.Bull. 64 (1985) 1356–1359
Haggerty, J.S. und W.R. Cannon, Sinterable Powders from Laser-Driven Reactions, in “Laser-Induced Chemical Processes”, Herausg. J.I. Steinfeld, Plenum, New York 1981, S. 165–241
Frurip, D.J., P.R. Staszak und M. Blander, J.Non-Cryst.Solids 68 (1984) 1
Gupta, A., A. West und J.P. Donlan, Proc.Soc.Photo-Opt.Instr.Eng.(SPIE) 458 (1984) 61
Gupta, A., K.W. Beeson, J.P. Donlan und G.A. West, Titanium silicide ultrafine powder: CO2 laser generation and thin film applications, J.Appl.Phys. 61 (1987) 1162–1167
Rice, G.W. und R.L. Woodin, Laser synthesis of powders from large molecules, Proc.Soc.Photo-Opt.Instr. Eng. (SPIE) 458 (1984) 98
Cannon, W.R., S.C. Danforth, J.H. Flint, J.S. Haggerty und R.A. Marra, Sinterable Ceramic Powders from Laser Driven Reactions: I. Process, Description and Modeling, J.Am.Ceram.Soc. 65 (1982) 324–330
Cannon, W.R., S.C. Danforth, J.S. Haggerty und R.A. Marra, Sinterable Ceramic Powders from Laser Driven Reactions: II. Powder, Characteristics and Process Variables, J.Am.Ceram.Soc. 65 (1982) 330–335
Flint, J.H. und J.S. Haggerty, Ceramic Powders from Laser Driven Reactions, Proc.Soc.Photo-Opt.Instr. Eng. (SPIE) 458 (1984) 108
Gupta, A. und J.T. Yardley, Production of light olefins from synthesis gas using catalysts prepared by laser pyrolysis, Proc.Soc.Photo-Opt.Instr.Eng.(SPIE) 458 (1984) 131
Shimo, N. und K. Yoshihara, Fine Metal Particle Formation from Organometallic Compounds by Laser Ignited Mild Explosive Reaction, Mat.Res.Soc.Symp.Proc. 129 (1989) 99–104
Buerki, P.R. und S. Leutwyler, Homogeneous nucelation of diamond powder by CO2-laser-driven gas-phase reactions, J.Appl.Phys. 69 (1991) 3739–3744
Gonsalves, K.E., P.R. Strutt und T.D. Xiao, Synthesis of Ceramic Nanoparticles by the Ultrasonic Injection of an Organosilazane Precursor, Adv.Mater. 3 (1991) 202–204
Cauchetier, M., O. Croix, M. Luce, M. Michon, J. Paris und S. Tistchenko, Laser synthesis of ultrafine powders, in “High Tech Ceramics”, Herausgeber P. Vincenzini, Elsevier, Amsterdam 1987, S. 545–553; ebenso veröffentlicht in Ceramics International, Band 13, No. 1
Chorley, R.W. und P.W. Lednor, Synthetic Routes to High Surface Area Non-Oxide Materials, Adv.Mater. 3 (1991) 474–485
Shimo, N., N. Nakashima und K. Yoshihara, Laser-Ignited Explosive Decomposition of Organometallic Compounds, Chem. Phys.Lett. 156 (1989) 31–34
Shimo, N. und K. Yoshihara, Laser Production of Metal Fine Particles from Organometallic Compounds, High.Temp.Sci. 27 (1990) 89–95
Shimo, N., M. Fujita und H. Kuma, Highly efficient formation of metal and metal alloy particles from methyl metal compounds by a single pulse laser irradiation, Appl.Organomet.Chem. 5 (1991) 303–307
Ho, P., M.E. Coltrin, J.S. Binkley und C.F. Melius, A Theoretical Study of the Heats of Formation of Si2Hn (n = 0–6) Compounds and Trisilane, J.Phys.Chem. 90 (1986) 3399–3407
Willwohl, H. und J. Wolfrum, Excimer laser photolysis of metalorganic complexes of platinum and palladium in the gas phase, Appl.Surf.Sci. 54 (1992) 89–94
Gleiter, H., Nanostrukturierte Materialien, Phys.Bl. 47 (1991) 753–759 sowie Nanocrystalline Materials, in “Advanced Structural and Functional Materials”, Herausgeber W.G.J. Bunk, Springer, Berlin 1991, S. 1–37
Göbel, E., Künstliche Übergitter in Festkörpern (Einführung), Phys.Bl. 45 (1989) 435–436
Döhler, G.H., Künstliche Übergitter in Halbleitern, Phys. B1. 45 (1989) 436–441
Ley, L., Amorphe Übergitter, Phys.Bl. 45 (1989) 442–446
Hillebrands, B. und G. Güntherodt, Metallische Übergitter, Phys. B1. 45 (1989) 447–452
Siegel, R.W., Cluster-Assembled Nanophase Materials, Ann.Rev.Mater.Sci. 21 (1991) 559–578
Opitz, J., Conference Report: Ceramic Powder Processing in San Diego, Adv. Mater. 2 (1990) 499–501
Jasinski, J.M., B.S. Meyerson und B.A. Scott, Mechanistic Studies of Chemical Vapor Deposition, Ann.Rev.Phys.Chem. 38 (1987) 109–140
Bauerle, D., Chemical Processing with Lasers, Springer Series in Materials Science, Band 1, Springer, Berlin 1986
Boyd, I.W., Laser Processing of Thin Films and Microstructures, Springer Series in Materials Science, Band 3, Springer, Berlin 1987
Ehrlich, D.J. und J.Y. Tsao (Herausgeber), Laser Microfabrication - Thin Film Processes and Lithography, Academic Press, Boston 1989
Johnson, A.W., G.L. Loper und T.W. Sigmon (Herausgeber), Laser-and Particle-Beam Chemical Processes on Surfaces, Mat.Res.Soc.Symp. Proc., Band 129, Pittsburgh 1989
Osgood, R.M. Jr., Laser Microchemistry and Its Application to Electron-Device Fabrication, Ann. Rev.Phys.Chem. 34 (1983) 77–101
Ehrlich, D.J. und J.Y. Tsao, A review of laser-microchemical processing, J.Vac.Sci.Technol. B 1 (1983) 969–984
Bauerle, D., Laser-Induced Chemical Vapor Deposition, Springer Series in Chemical Physics, Band 39, Springer, Berlin 1984, S. 166–182
Osgood, R.M. Jr. und H.H. Gilgen, Laser Direct Writing of Materials, Ann.Rev.Mater.Sci. 15 (1985) 549–576
Solanki, R., C.A. Moore und G.J. Collins, Laser-Induced Chemical Vapor Deposition, Solid State Technology, Juni 1985, S. 220–227
Rytz-Froidevaux, Y., R.P. Salathe und H.H. Gilgen, Laser Generated Microstructures, Appl.Phys. A 37 (1985) 121–138
Bernhardt, A.F., B.M. McWilliams, F. Mitlitsky und J.C. Whitehead, Laser Microfabrication Technology and Its Application to High Speed Interconnect of Gate Arrays, Mat.Res.Soc.Symp.Proc. 75 (1987) 633–644 sowie ibid. 76 (1987) 223–234
Hanabusa, M., Photoinduced Deposition of Thin Films, Mat.Sci.Rep. 2 (1987) 51–98
Stafast, H., State and perspectives of laser applications in advanced chemistry, Commission of the European Communities, Report EUR 11795 EN, Brüssel 1988
Bauerle, D., Chemical Processing with Lasers: Recent Developments, Appl.Phys. B 46 (1988) 261–270
Reiße, G., S. Weißmantel und K, Zimmer, Laserinduzierte Abscheidung, Erzeugung und Modifizierung von Schichten, in KDT-Lehrgang “Lasertechnik”, Lehrmaterial 1: Zum Stand der Lasermaterialbearbeitung, G. Zscherpe, G. Reiße und A. Fischer (Herausgeber), Kammer der Technik, Berlin 1988, S. 19–55
Herman, I.P., Laser-Assisted Deposition of Thin Films from Gas-Phase and Surface-Adsorbed Molecules, Chem.Rev. 89 (1989) 1323–1357, Übersichtsartikel mit 376 Zitaten
Kompa, K.L., Laser-Photochemie an Oberflächen–laserinduzierte Gasphasenabscheidung und verwandte Phänomene, Angew.Chem. 100 (1988) 1287–1299
Bäuerle, D., B. Luk’yanchuk und K. Piglmayer, On the Reaction Kinetics in Laser-Induced Pyrolytic Chemical Processing, Appl.Phys. A 50 (1990) 385–396
Baum, T.H. und P.B. Comita, Laser-induced chemical vapor deposition of metals for microelectronics technology, Thin Solid Films 218 (1992) 80–94
Yabuzaki, T., T. Sato und T. Ogawa, Laser production of NaH crystalline particles, J.Chem.Phys. 73 (1980) 2780
Scholz, M., W. Fuß und K.-L. Kompa, Chemical Vapor Deposition of Silicon Carbide Powders Using Pulsed CO2 Lasers, Adv.Mater. 5 (1993) 38–40
Coltrin, M.E., R.J. Kee und J.A. Miller, A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor,.J.Electrochem.Soc. 131 (1984) 425–434 sowie Patnaik, S. und R.A. Brown Convection and Mass-Transport in Laser-Induced Chemical Vapor Deposition, J.Electrochem.Soc. 135 (1988) 697–706
Heywang, W. und R.D. Plättner, Amorphes Silizium - ein neues Halbleitermaterial für Solarzellen, Metall 37 (1983) 49
Joannopoulos, J.D. und G. Lukovsky (Herausgeber), The Physics of Hydrogenated Amorphous Silicon, I und II, Topics in Applied Physics, Band 55 und 56, Springer, Berlin 1984
Pankove, J.I. (Herausgeber), Hydrogenated Amorphous Silicon, Semiconductors and Semimetals, Band 21, Academic, Orlando 1984
Winterling, G., Amorphes Silizium (a-Si), Physik in unserer Zeit 16 (1985) 50–62
Takahashi, K. und M. Konagai, Amorphous Silicon Solar Cells, Academic, Oxford 1986
Böhm, M., Advances in Amorphous Silicon Based Thin Film Microelectronics, Solid State Technology, September 1988, S. 125–131
Le Comber, P.G., Present and Future Applications of Amorphous Silicon and Its Alloys, J.NonCryst.Solids 115 (1989) 1–13
Elliot, S.R., The structure of amorphous hydrogenated silicon and its alloys: A review, Adv.Phys. 38 (1989) 1–88; detaillierte Beschreibung
Stafast, H., Initial Steps in the Photochemical Vapour Deposition of Amorphous Silicon, Appl.Phys. A 45 (1988) 93–102
Meunier, M., J.H. Flint, J.S. Haggerty und D. Adler, Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon. I. Gas-Phase Process Model, J.Appl.Phys. 62 (1987) 2812–2821
Itoh, U., Y. Toyoshima, H. Onuki, N. Washida und T. Ibuki, Vacuum Ultraviolet Absorption Cross Sections of SiH4, GeH4, Si2H6, and Si3H8, J.Chem.Phys. 85 (1986) 4867–4872
Tanaka, H., L. Boesten, M. Kimura. M.A. Dillon und D. Spence, Observation of the Lowest Triplet State in Silane by Electron Energy Loss Spectroscopy, J.Chem.Phys. 92 (1990) 2115–2116
Curcio, F., I. Gianinoni und M. Musci, CO2 Laser-Assisted Deposition of Amorphous Semiconductors, in “Laser Processing and Diagnostics (II)”, E-MRS Spring Conf Proceed., Strasbourg, Juni 1986, D. Bauerle, K.L. Kompa, und L.D. Laude (Herausgeber), Edit. de Physique, Les Ulis 1986, S. 117–123
Branz, H.M., L.K. Liem, C.J. Harris, S. Fan, J.H. Flint, D. Adler und J.S. Haggerty, Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon: Photovoltaic Devices and Material Properties, Solar Cells 21 (1987) 177–188
Golusda, E., R. Lange, G. Mollekopf und H. Stafast, On the Role of the Substrate Position in the CO2 Laser CVD of Amorphous Hydrogenated Silicon, Appl.Surf.Sci. 46 (1990) 230–232
Golusda, E., R. Lange, K.-D. Lühmann, G. Mollekopf, M. Wacker und H. Stafast CW, CO2 laser CVD of amorphous hydrogenated silicon (a-Si:H): influence of the deposition geometry, Appl.Surf Sci. 54 (1992) 30–34
Metzger, D., K. Hesch und P. Hess, Process Characterization and Mechanism for Laser-Induced Chemical Vapor Deposition of a-Si:H from SiH4, Appl.Phys. A 45 (1988) 345–353
Veprek, S., F.-A. Sarrot, S. Rambert und E. Taglauer, Surface hydrogen content and passivation of silicon deposited by plasma induced chemical vapor deposition from silane and the implications for the reaction mechanism, J.Vac.Sci.Technol. A 7 (1989) 2614–2624
Meunier, M., J.H. Flint, J.S. Haggerty und D. Adler, Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon. II. Film Properties, J.Appl.Phys. 62 (1987) 2822–2831
Roth, A., S. Chiussi, T.R. Dietrich und F.-J. Comes, Hydrogenated Amorphous Silicon by Infrared Multiphoton Absorption with a Pulsed CO2-Laser, Ber.Bunsenges.Phys.Chem. 94 (1990) 1105–1110
Yamada, A., M. Konagai and K. Takahashi, Excimer-Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon, Jpn.J.Appl.Phys. 24 (1985) 1586–1589
Tanaka, K. and A. Matsuda, Glow-Discharge Amorphous Silicon: Growth Process and Structure, Mat.Sci.Rep. 2 (1987) 139–184
Dietrich, T.R., S. Chiussi, H. Stafast and F.J. Comes, ArF Laser CVD of Hydrogenated Amorphous Silicon: The Role of Buffer Gases, Appl.Phys. A 48 (1989) 405–414
Hesch, K., S. Hess. H. Oetzmann and C. Schmidt, Precision Surface Temperature Measurement and Film Characterization for LICVD of a-Si:H from SiH4 Appl.Surf.Sci. 36 (1989) 81–88
Golusda, E., S. Hessenthaler, G. Mollekopf and H. Stafast, SF6 sensitized CO2 laser CVD of amorphous silicon, Appl.Surf.Sci., im Druck
Barth, M., S. Hess, G. Mollekopf and H. Stafast, in Vorbereitung
Martin, J.G., H.E. O’Neal and M.A. Ring, Thermal Decomposition Kinetics of Polysilanes: Disilane, Trisilane, and Tetra-silane, Int.J.Chem.Kinet. 22 (1990) 613–632
Dietrich, T.R., S. Chiussi, M. Marek, A. Roth and F.J. Comes, Role of Silylene in the Deposition of Hydrogenated Amorphous Silicon, J.Phys.Chem. 95 (1991) 9302–9310
Zavelovich, J. and J.L. Lyman, Photochemical Synthesis of Disilane from Silane with Infrared Laser Radiation, J.Phys.Chem. 93 (1989) 5740–5745
Bayer, E., W. Kusian and G. Schneider, ArF Laser Photochemical Vapor Deposition of Si Films with Various Carrier Gases, Siemens Forsch.- u. Entwickl.-Ber. 17 (1988) 190–194
Lowndes, D.H., D.B. Geohegan, D. Eres, S.J. Pennycook, D.N. Mashburn and G.E. Jellison Jr., Low Temperature Photon-Controlled Growth of Thin Films and Multilayered Structures, Appl.Surf.Sci. 36 (1986) 56–69 sowie Lowndes, D.H., D.B. Geohegan, D. Eres, S.J. Pennycook, D.N. Mashburn and G.E. Jellison Jr. Photon-controlled fabrication of amorphous superlattice structures using ArF (193 nm) excimer laser photolysis, Appl.Phys.Lett. 52 (1988) 1868–1870
Hess, P., Chemical vapor deposition of amorphous hydrogenated silicon: Chemistrystructure-performance relationships, J.Vac.Sci.Technol. B10 (1992) 239–247
Hesch, K., H. Karstens and P. Hess, Chemical vapour deposition of amorphous hydrogenated silicon with a CO2 laser: chemical mechanism, Thin Solid Films 218 (1992) 29–39
Burke, H.H., I.P. Herman, V. Tavitian and J.G. Eden, Laser photochemical deposition of germanium-silicon alloy thin films, Appl.Phys. Lett. 55 (1989) 253–255
Uwasawa, K., F. Ishihara and S. Matsumoto, X-ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide, Appl. Phys.Lett. 60 (1992) 1208–1210
Zarnani, H., H. Demiryont und G.J. Collins, Optical properties of UV laser photolytic deposition of hydrogenated amorphous silicon (a-Si:H), J.Appl.Phys. 60 (1986) 2523–2529
Toyoshima, Y., K. Kumata, U. Itoh und A. Matsuda, Hydrogenated amorphous silicon prepared by ArF and FZ excimer laser-induced photochemical vapor deposition, Appl.Phys.Lett. 51 (1987) 1925–1927
Skouby, D.C. und K.F. Jensen, Modeling of pyrolytic laser-assisted chemical vapor deposition: Mass transfer and kinetic effects influencing the shape of the deposit, J.Appl.Phys. 63 (1988) 198–206
Christensen, C.P. und K.M. Lakin, Chemical vapor deposition of silicon using a CO2 laser, Appl.Phys.Lett. 32 (1978) 254–256
Tonneau, D., J. Pauleau und G. Auvert, Chemical processes promoted by CO2 laser-assisted decomposition of silane on silica substrates, J.Appl.Phys. 65 (1989) 4410–4413
Auvert, G., D. Tonneau und Y. Pauleau, Evidence of a photon effect during the visible laser-assisted deposition of polycrystalline silicon from silane, Appl.Phys.Lett. 52 (1988) 1062–1064
Yamada, A., A. Satoh, M. Konagai und K. Takahashi, Low-temperature (600–650°C) silicon epitaxy by excimer laser-assisted chemical vapor deposition, J.Appl.Phys. 65 (1989) 4268–4272
Zenobi, R., J.H. Hahn und R.N. Zare, Surface Temperature Measurement of Dielectric Materials Heated by Pulsed Laser Radiation, Chem.Phys.Lett. 150 (1988) 361–365
Preuß, S., Experimente zur laserchemischen Abscheidung von Metallen, Diplomarbeit, Universität Frankfurt, 1990
Hollemann, A.F. und E. Wiberg, Lehrbuch der anorganischen Chemie, Walter de Gruyter, 57.-70. Auflage, Berlin 1964, S. 557
Schmidt, M., Anorganische Chemie 2, B.I. Hochschultaschenbücher, Band 150, B.I. Wissenschaftsverlag, Mannheim 1969, S. 65
Schröder, H., S. Metev, W. Robers und B. Rager, Photochemistry of Surface Metallization with Excimer Lasers, in “Laser Processing and Diagnostics (II)”, D. Bäuerle, K.L. Kompa, und L.D. Laude (Herausgeber), Edit. de Physique, Les Ulis 1986, S. 71–77
Schröder, H., B. Rager, S. Metev, N. Rösch und H. Jörg, Photochemistry of Transition Metal Complexes, in “Interfaces Under Laser Irradiation”, ConfProceed. NATO Advanced Study Institute, 14.-26.Juli 1986, Maraka, Italien, Herausg. L.D. Laude, D. Bäuerle und M. Wautelet, Martinus Nijhoff, Boston 1987, S. 255–276
Rager, B., W. Robers, H. Schröder und K.L. Kompa, Beam Studies of LCVD, in “Lasers Processing and Diagnostics (II)”, D. Bäuerle, K.L. Kompa und L.D. Laude (Herausgeber), Edit. de Physique, Les Ulis 1986, 5. 101–106
Schröder, H., K.L. Kompa, D. Masci und I. Gianinoni, Investigation of UV-Laser Induced Metallization: Platinum from Pt(PF,)„ Appl.Phys. A 38 (1985) 227–233
Stevens, A.E., C.S. Feigerle und W.C. Lineberger, Laser photoelectron spectrometry of Ni(CO)n - n = 1–3, J.Amer.Chem.Soc. 104 (1982)5026–5031
Rösch, N., M. Kotzian, H. Jörg, H. Schröder, B. Rager und S. Metev, On Visible Transients in Gas Phase UV Photolysis of Transition Metal Compounds: Experimental and Theoretical Results for Ni(CO)4 J.Amer.Chem.Soc. 108 (1986) 4238–4239
Kräuter, W., D. Bäuerle und F. Fimberger, Laser Induced Chemical Vapor Deposition of Ni by Decomposition of Ni(CO)4 Appl.Phys. A 31 (1983) 13–18
Petzoldt, F., K. Piglmayer, W. Kräuter und D. Bäuerle, Lateral Growth Rates in Laser CVD of Microstructures, Appl.Phys. A 35 (1984) 155–159
Allen, S.D., R.Y.Jan, R.H. Edwards, S.M. Mazuk und S.D. Vernon, Optical and Thermal Effects in Laser Chemical Vapor Deposition, Proc.Soc.PhotoOpt.Instr.Eng. (SPIE) 459 (1984) 42–48
Allen, S.D., Laser chemical vapor deposition: A technique for selective area deposition, J.Appl.Phys. 52 (1981) 6501–6505
Brueck, S.J.R. and D.J. Ehrlich, Stimulated Surface-Plasma-Wave Scattering and Growth of a Periodic Structure in Laser-Photodeposited Metal Films, Phys.Rev.Lett. 48 (1982) 1678–1681
Du, Y.C., U. Kempfer, K. Piglmayer, D. Bäuerle und U.M. Titulaer, New Types of Periodic Structures in Laser-Induced Chemical Vapor Deposition, Appl.Phys. A 39 (1986) 167–171
Preuß, S. und H. Stafast, CO2 Laser CVD of Copper Lines with Twofold Periodic Structures, Appl.Phys. A 54 (1992) 152–157
Bezuk, S.J., R.J. Baseman, C. Kryzak, K. Warner und G. Thomes, Pyrolytic Laser Direct Writing of Nickel over Polyimides, Mat.Res.Soc.Symp.Proc. 75 (1987) 75–81
Wedler, G., Lehrbuch der Physikalischen Chemie, 3. Auflage, VCH, Weinheim 1987, S. 390
Kazmierzki, K.L., Analysis and Characterization of Thin Films: A Tutorial, Solar Cells 24 (1988) 387–418
Feldman, L.C. und J.M. Mayer, Fundamentals of Surface and Thin Film Analysis, North-Holland, New York 1986
Ertl, G. und J. Köppers, Low Energy Electrons and Surface Chemistry, VCH, Weinheim 1985
Campion, A., Raman Spectroscopy of Molecules Adsorbed on Solid Surfaces, Ann.Rev.Phys. Chem. 36 (1985) 549–572
Lin, M.C. and G. Ertl, Laser Probing of Molecules Desorbing and Scattering from Solid Surfaces, Ann.Rev.Phys.Chem. 37 (1986) 587–615
Ceyer, S.T., Dissociative Chemisorption: Dynamics and Mechanisms, Ann.Rev.Phys.Chem. 39 (1988) 479–510
Steinfeld, J.I., Reactions of Photogenerated Free Radicals at Surfaces of Electronic Materials, Chem.Rev. 89 (1989) 1291–1301
Oehr, C. and H. Suhr, Deposition of Silver Films by Plasma-Enhanced Chemical Vapor Deposition, Appl.Phys. A 49 (1989) 691–696
Hess, P., IR and UV Laser-Induced Chemical Vapor Deposition: Chemical Mechanism for a-Si:H and Cr(O,C) Film Formation, Spectrochim.Acta 46A (1990) 489–497
Deutsch, T.F. and D.D. Rathman, Comparison of Laser-Initiated and Thermal Chemical Vapor Deposition of Tungsten Films, Appl.Phys.Lett. 45 (1984) 623–625
Gottsleben, O., H.W. Roesky and M. Stuke, Two-Step Generation of Aluminum Microstructures on Laser Generated Pd Prenucleation Patterns Using Thermal CVD from (Trimethylamine)trihydroaluminum, Adv.Mater. 3 (1991) 201–202
Oprysko, M.M. and M.W. Beranek, Nucleation Effects in Visible-Laser Chemical Vapor Deposition, J.Vac.Sci.Technol. B5 (1987) 496–503
Doll, J.D. and A.F. Voter, Recent Developments in the Theory of Surface Diffusion, Ann.Rev.Phys.Chem. 38 (1987)413–443
Katsuhiko, M., Y. Yamada, T. Iwabuchi and T. Miyata, Tungsten-carbon multilayers for X-ray optics prepared by ArF excimer-laserinduced chemical vapor deposition, J.Appl.Phys. 68 (1990) 1361–1363
Solanki, R., W.H. Ritchie and G.J. Collins, Photodeposition of aluminum oxide and aluminum thin films, Appl.Phys.Lett. 43 (1983) 454–456
Chen, Q., J.S. Osinski and P.D. Dapkus, Quantum well lasers with active region grown by laser-assisted atomic layer epitaxy, Appl.Phys.Lett. 57 (1990) 1437–1439
Hopfe, V., A. Tehel, A. Baier and J. Scharsig, IR-laser CVD of TiB2, TiCx, and TiCxNy coatings on carbon fibres, Appl.Surf.Sci. 54 (1992) 78–83
Tsao, J.Y., R.A. Becker, D.J. Ehrlich and F.J. Leonberger, Photodeposition of Ti and application to direct writing of Ti:LiNbO3 waveguides, Appl.Phys.Lett. 42 (1983) 559–561
Lavoie, C., M. Meunier, R. Izquierdo, S. Boivin and P. Desjardins, Large Area Excimer Laser Induced Deposition of Titanium from Titanium Tetrachloride, Appl.Phys. A 53 (1991) 339–342
Katayama, H., T. Norimatsu, S. Nakai and C. Yamanaka, Hydrocarbon coating by laser-induced chemical vapor deposition onto microsphere target levitated by a viscous gas jet, J.Vac.Sci.Technol. A 8 (1990) 855–860
Sugimura, A., Y. Fukuda and M. Hanabusa, Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses, J.Appl.Phys. 62 (1987) 3222–3227 sowie Kubo, M. and M. Hanabusa Fabrication of Microlenses by Laser Chemical Vapor Deposition, Appl.Opt. 29 (1990) 2755–2759
Corning Glass Works, Tiny CCD Lenses, Photonics Spectra, November 1987, S. 34–35
Yamada, Y., K. Mutoh, T. Iwabuchi and T. Miyata, Laser-Beam-Scanning Chemical Vapor Deposition Technique for Controlling the Spatial Thickness Distribution of Thin Films, Jpn.J.Appl.Phys. 30 (1991) 1740–1741
Tanaka, T., T. Fukuda, Y. Nagasawa, Miyazaki and M. Hirose, Atomic layer growth of silicon by excimer laser induced cryogenic chemical vapor deposition, Appl.Phys.Lett. 56 (1990) 1445–1447
Horiike, Y., T. Tanaka, M. Nakano, S. Iseda, H. Sakane, A. Nagata, H. Shindo, S. Miyazaki and M. Hirose, Digital chemical vapor deposition and etching technologies for semiconductor processing, J.Vac.Sci.Technol. A 8 (1990) 1844–1850
Westberg, H. F. Ericson, J. Engquist, M. Boman and J.-O. Carlsson, Laser-Induced Chemical Vapour Deposition of TiSi2: Aspects of Deposition Process, Microstructure and Resistivity, Thin Solid Films 198 (1991) 279–292
Yamada, T., R. Iga and H. Sugiura, GaAs Corrugation pattern with submicron pitch grown by Ar ion laser-assisted metalorganic molecular beam epitaxy, Appl.Phys.Lett. 59 (1991) 958–960
Ehrlich, D.J. and J.Y. Tsao, UV laser photodeposition of patterned catalyst flms from adsorbate mixtures, Appl.Phys.Lett. 46 (1985) 198–200
Lehmann, O. and M. Stuke, Generation of Three-Dimensional Free-Standing Metal Micro-Objects by Laser Chemical Processing, Appl.Phys. A 53 (1991) 343–345
Ganz, J. and E. Köhler, Strukturierung von Oberflächen durch Laser-CVD, in “Dünnschichttechnologien ‘80”, Band I, VDI-Verlag GmbH, Düsseldorf 1990, S. 184–207
Goto, J., T. Yagi and H. Nagai, Synthesis of Diamond Films by Laser-Induced Chemical Vapor Deposition, Mat.Res.Soc.Symp.Proc. 129 (1989) 213–217
Hussien, S.A., A.A. Fahmy, N.A. El-Masry and S.M. Bedair, A criterion for the suppression of plastic deformation in laser-assisted chemical vapor deposition of GaAs, J.Appl.Phys. 67 (1990) 3853–3857
Auvert, G., D. Tonneau, Y. Guern und G. Pelous, A repair machine for VLSI using laser induced micro-chemistry, Proc.Soc.PhotoOpt.Instr. Eng. (SPIE) 1022 (1988) 58–64
Fa. Kammerer GmbH, Postfach 130120, D-Pforzheim-Huchenfeld, Firmenmitteilung Nr.8, März 1988/2
LABEL, Laser Applications Belgium, Site du Grand-Hornu, Sainte-Louise, B-7320 Boussu, Prospekt Juni 1990
Heck, S., Th. Kruck und Th. Sassen, MOCVD - Basis für neue Schichttechnologien, Magazin für Neue Werkstoffe 3/90, S. 9–11
Bagratashvili, V.N., A.F. Banishev, S.A. Gnedoy, V.I. Emelyanov, A.N. Jerikhin, K.S. Merzljakov, V.Ya. Panchenko und V.N. Seminogov, Formation of Periodic Ring Structures of Relief and Voids Under Laser Vapor Deposition of Metallic Films, Appl.Phys. A 52 (1991) 438–444
Ward, T.L., T.T. Kodas und R.L. Jackson, Kinetics of laser-photochemical deposition by gas-phase dissociation, J.Appl.Phys. 69 (1991) 1000–1007
Hiura, Y., Y. Morishige und S. Kishida, Laser chemical vapor deposition direct patterning of insulating film, J.Appl.Phys. 69 (1991) 1744–1747
Liu, H., J.C. Roberts, J. Ramdani und S.M. Bedair, Laser selective area epitaxy of GasAs metal-semiconductor-field-effect transistor, Appl.Phys.Lett. 58 (1991) 1659–1661
Flint, E.B., J. Messelhäuser und H. Suhr, Laser-Induced CVD of Rhodium, Appl.Phys. A 53 (1991) 430–436 sowie Messelhäuser, J., E.B. Flint und H. Suhr Direct Writing of Pure Rhodium Lines by Laser Induced Chemical Vapor Deposition, Adv.Mater. 4 (1992) 347–349
Henley, F.J., Early Detection and Repair of AMLCD Defects, Solid State Technology, April 1992, S. 65–68
Elders, J., Laser-Induced Chemical Vapor Deposition of Titanium Diboride, Dissertation, Universität Amsterdam 1992
Gross, M.E., K.P. Cheung, C.G. Fleming, J. Kovalchick und L.A. Heimbrook Metalorganic chemical vapor deposition of aluminum from trimethylamine alane using Cu and TiN nucleation activators, J.Vac.Sci.Technol. A 9 (1991) 57–64
Comita, P.B., Surface Modification with Lasers, Adv.Mater. 2 (1990) 82–90
Boman, M., H. Westberg, S. J.hansson und J.-A. Schweitz, Helical Microstructures Grown by Laser Assisted Chemical Vapor Deposition, in “Micro Electro Mechanical Systems”, Herausgeber W. Benecke und H.C. Petzold, IEEE Proceed., Travemünde, 4.-7. Februar 1992, S. 162–167
Roth, W. und K.W. Hoffmann, Laserinduzierte Erzeugung hochreiner siliziumorganischer Schichten aus der Gasphase (LCVD), Präsentation auf der Diskussionstagung “Photochemie” der GDCh, Aachen, 20. November 1991
Gottsleben, O. und M. Stuke, Selective amplification of self-resistively heated laser-direct-written tungsten lines, Appl.Phys.Lett. 52 (1988) 2230–2232
Houle, F.A., T.H. Baum und C.R. Moylan, Laser deposition of films from acetylacetonate complexes, Cambridge Stud.Mod.Opt. 7 (1989) 25–60
Kammerer GmbH, Strukturierung von Oberflächen durch Laser-CVD, in “Statusseminar 1988 Dünnschichttechnologien”, Herausgeber VDI-TZ, Düsseldorf, S. 23. 1–23. 7
Black, J.G., S.P. Doran, M. Rothschildt und D.J. Ehrlich, Low-temperature laser deposition of tungsten by silane-and disilane-assisted reactions, Appl.Phys.Lett. 56 (1990) 1072–1074
Kollia, Z., V. Zafiropulos, C. Fotakis und J.A.D. Stockdale, Laser induced clustering in thiophenol, J.Chem.Phys. 94 (1991) 2374–2375
Johansson, S., J.-A. Schweitz, H. Westberg und M. Boman, Microfabrication of three-dimensional boron structures by laser chemical processing, J.Appl.Phys. 72 (1992) 5956–5963
Eres, D., D.B. Geohegan, D.H. Lowndes und D.N. Mashbum, ArF Laser Photochemical Deposition of Amorphous Silicon from Disilane: Spectroscopic Studies and Comparison with Thermal CVD, Appl.Surf.Sci. 36 (1989) 70–80
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Stafast, H. (1993). Laserchemische Abscheidung von Festkörpern aus der Gasphase. In: Angewandte Laserchemie. Laser in Technik und Forschung. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-51140-0_6
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