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Thin Film and Depth Profile Analysis pp 39–61Cite as

Depth Profile and Interface Analysis of Thin Films by AES and XPS

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Part of the book series: Topics in Current Physics ((TCPHY,volume 37))

Abstract

Over the last ten years analysis of very thin films has become increasingly important. Thin-film technology today covers a broad range in material sciences from microelectronics [3.1–.5] and optics [3.6–.8], to chemistry (catalysis [3.9–.11] and polymers [3.12,138], electrochemistry and corrosion [3.14–.20], ceramics [3.21,139], metallurgy [3.22–.32], wear [3.33–.40,140,141] to biomedical applications [3.41–.43, 142]. Analytical techniques for these submicron films can be classified according to the properties to which probes are most sensitive:

  1. a)

    elemental and chemical composition of thin films;

  2. b)

    composition and width of the interface;

  3. c)

    crystalline structure;

  4. d)

    surface morphology and microstructure.

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  1. Universität Kaiserslautern, Erwin-Schrödinger-Straße, Gebäude 46, D-6750, Kaiserslautern, Fed. Rep. of Germany

    Hans Oechsner

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Mathieu, H.J. (1984). Depth Profile and Interface Analysis of Thin Films by AES and XPS. In: Oechsner, H. (eds) Thin Film and Depth Profile Analysis. Topics in Current Physics, vol 37. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-46499-7_3

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  • DOI: https://doi.org/10.1007/978-3-642-46499-7_3

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-46501-7

  • Online ISBN: 978-3-642-46499-7

  • eBook Packages: Springer Book Archive

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