Summary
Supersmooth surfaces with a roughness of 0.05 nm have been developed. Nomarski differential interference contrast microscopy was used to characterize the quality of the surfaces. Using an especially selected microscope objective, the microscope system resolves an rms roughness of lower than 0.05 nm. Photomicrographs of these supersmooth surfaces of BK7, Zerodur, and silicon are being presented. To obtain quantitative informations, the roughness of the surfaces was determined using light scattering, phase-shifting interferometry, heterodyne interferometry and stylus profilometry.
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© 1990 Springer-Verlag Berlin Heidelberg
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Schmitt, DR. (1990). Characterization of Supersmooth Surfaces with Roughness Below 0.1 nm. In: Reichl, H. (eds) Micro System Technologies 90. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-45678-7_26
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DOI: https://doi.org/10.1007/978-3-642-45678-7_26
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-45680-0
Online ISBN: 978-3-642-45678-7
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