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A Surface Scientist’s View on Spectroscopic Ellipsometry

  • Chapter
Surface Science Techniques

Part of the book series: Springer Series in Surface Sciences ((SSSUR,volume 51))

Abstract

Nowadays, a broad choice of instruments, including dedicated synchrotron radiation beamlines, allows to exploit Spectroscopic Ellipsometry (SE) to investigate the thickness and the dielectric properties of thin films, from the terahertz down to the VUV wavelength range. Instruments combining fast parallel detection, precision, accuracy, are pushing forward real time and in-situ applications, to monitor the dynamics of processes such as e.g. film growth, oxidation, polymerization, electrochemical processes, with a diverging spectrum of scientific and industrial applications in the fields of nano-electronics, coatings, solar cell materials, polymer technology, bio-sensing, photonics, just to name a few. This chapter, beyond presenting the essentials of principles and instrumentation of SE, is intended to place this thin-film technique in the perspective of the surface scientist, through the selection of applications to ultra-thin films and nanostructures. Emphasis is placed on reflection experiments, in the 190–1700 nm wavelength range covered by high-quality commercial instruments, although some infra-red (IRSE) and far UV experiments are also discussed.

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Notes

  1. 1.

    Cf. [4, 5] for synthetic historical accounts.

  2. 2.

    The proceedings of the last ICSE-V have been published in Ref. [18].

  3. 3.

    Cf. [19] for an accurate discussion of the equation also in relation to the coordinate system and different conventions in use for Fresnel equations.

  4. 4.

    In practice, the backside of transparent substrates is prepared to be not reflective; see for example [20].

  5. 5.

    The software of commercial instruments includes libraries with optical properties of many materials. These data are generally accurate but should be always considered with caution since optical properties of substrates and films may depend significantly on the preparation, post-growth treatments, ageing and contamination effects.

  6. 6.

    The work of Bruggemann is in German. The reader interested in original sources may consider the reading of the splendid paper of J.C.M. Garnett [40].

  7. 7.

    EMA models play a key role in optical studies of systems of complex morphology such for example films with not-uniform density and films with intrinsic granularity or porosity. More details in Sect. 4.4.3.

  8. 8.

    For a critical discussion of the surface roughness modeling, also in relation to AFM determinations see the recent Ref. [43].

  9. 9.

    In the most general description the polarization state of a light beam is described by the Poincaré sphere and the Stokes formalism is adopted, leading to the concept of 4×4 Mueller matrix [12].

  10. 10.

    In the IRSE community however, it is sometimes preferred to look at spectra normalized to some convenient reference spectrum [67].

  11. 11.

    A detailed account, including a discussion on the dependence on the ambient, can be found in Ref. [66].

  12. 12.

    Configurations which cannot be classified in these two categories have been also presented [88].

  13. 13.

    A slightly more complicated formulas hold for the RCE instrument.

  14. 14.

    For commercial instruments this is accomplished by the producer.

  15. 15.

    Cf. e.g. Sect. 4.4.3 of Ref. [10] for an agile discussion of the precision on film thickness and absorption coefficient determination in SE measurements.

  16. 16.

    Two smart methods for an accurate measurement of the refractive index of the liquid ambient, i.e. rough surface and prism minimum deviation techniques, are discussed in Ref. [149].

  17. 17.

    An updated review of the vast literature reporting on the application of SE to the SiO2–Si system can be found in a dedicated chapter of the HoE [168].

  18. 18.

    Cf. [223, 224] for details on this method.

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Acknowledgements

I thank Renzo Mattera and Silvana Terreni for their continuous support to my activity and all the people who collaborated along the years to the research on the optical properties of ultrathin films, and in particular Mirko Prato, Francesco Bisio, Ornella Cavalleri. A special thank to Luca Anghinolfi, Michael Caminale and Chiara Toccafondi for their help in experiments and in the graphics artwork of this chapter.

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  1. Department of Physics, University of Genoa, via Dodecaneso 33, 16146, Genoa, Italy

    Maurizio Canepa

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  1. Maurizio Canepa
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Correspondence to Maurizio Canepa .

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  1. , Department of Physics, University of Genoa, Via Dodecaneso 33, Genoa, 16146, Italy

    Gianangelo Bracco

  2. , Department of Physics and Technology, University of Bergen, Allegaten 55, Bergen, 5007, Svalbard

    Bodil Holst

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Canepa, M. (2013). A Surface Scientist’s View on Spectroscopic Ellipsometry. In: Bracco, G., Holst, B. (eds) Surface Science Techniques. Springer Series in Surface Sciences, vol 51. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-34243-1_4

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