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International Conference on Algorithms and Architectures for Parallel Processing

ICA3PP 2012: Algorithms and Architectures for Parallel Processing pp 41–55Cite as

Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs

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Part of the book series: Lecture Notes in Computer Science ((LNTCS,volume 7439))

Abstract

The e-beam lithography is used to provide high resolution circuit patterning for circuit fabrication processes. However, due to electron scattering in resist and substrate it occurs an undesired exposure of regions which are adjacent to the actual exposed regions. These proximity effects represent an essential limitation to the attainable lithographic resolution. Since these effects can be described mathematically, different approaches were investigated to simulate and correct them. The developed algorithms provide the required precision for printing of circuit patterns, but on the other side demand a tremendous computational power. Modern GPGPUs consist of hundreds of processing cores and provide the same computational power as a small cluster. Therefore, the required computational power of correction algorithms may be achieved using GPGPUs. In this paper, we evaluate the achievable performance for a short-range proximity effect correction algorithm using GPGPUs.

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Authors and Affiliations

  1. Friedrich-Alexander-University Erlangen-Nuremberg, Martensstr. 3, 91058, Erlangen, Germany

    Max Schneider & Dietmar Fey

  2. GenISys GmbH, Eschenstr. 66, 82024, Taufkirchen, Germany

    Nikola Belic, Christoph Sambale & Ulrich Hofmann

Authors
  1. Max Schneider
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  2. Nikola Belic
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  3. Christoph Sambale
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  4. Ulrich Hofmann
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  5. Dietmar Fey
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Editor information

Editors and Affiliations

  1. School of Information Technology, Deakin University, Melbourne Burwood Campus, 221 Burwood Highway, 3125, Burwood, VIC, Australia

    Yang Xiang

  2. SEECS, University of Ottawa, 8, King Edward Ave, K1N 6N5, Ottawa, ON, Canada

    Ivan Stojmenovic

  3. Department of Intelligent Informatics, Kyushu Sangyo University, 2-3-1 Matsukadai, Higashi-ku, 813-8503, Fukuoka, Japan

    Bernady O. Apduhan

  4. School of Information Science and Engineering, Central South University, 410083, Changsha, Hunan Province, P.R. China

    Guojun Wang

  5. Department of Information Engineering, Hiroshima University, 1-4-1, Kagamiyama, 739-8527, Higashi-Hiroshima, Japan

    Koji Nakano

  6. School of Information Technologies, University of Sydney, Building J12, 2006, Sydney, NSW, Australia

    Albert Zomaya

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© 2012 Springer-Verlag Berlin Heidelberg

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Schneider, M., Belic, N., Sambale, C., Hofmann, U., Fey, D. (2012). Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs. In: Xiang, Y., Stojmenovic, I., Apduhan, B.O., Wang, G., Nakano, K., Zomaya, A. (eds) Algorithms and Architectures for Parallel Processing. ICA3PP 2012. Lecture Notes in Computer Science, vol 7439. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-33078-0_4

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  • DOI: https://doi.org/10.1007/978-3-642-33078-0_4

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-33077-3

  • Online ISBN: 978-3-642-33078-0

  • eBook Packages: Computer ScienceComputer Science (R0)

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