Chemical Vapor Deposition of Carbon Nanotubes

  • Zhifeng Ren
  • Yucheng Lan
  • Yang Wang
Part of the NanoScience and Technology book series (NANO)


Chemical vapor deposition is a popular industrial method to grow carbon nanotubes because of the mass production at low cost. Such method is also a very important technique to in situ align carbon nanotubes. In this chapter, we introduce various chemical vapor deposition methods, including thermal chemical vapor deposition and plasma-enhanced chemical vapor deposition, as well as the mechanism of growth and alignment.


Chemical Vapor Deposition Chemical Vapor Deposition Process Thermal Chemical Vapor Deposition Catalytic Nanoparticles Direct Current Discharge 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Springer-Verlag Berlin Heidelberg 2012

Authors and Affiliations

  1. 1.Department of PhysicsBoston CollegeChestnut HillUSA
  2. 2.Department of PhysicsBoston CollegeChestnut HillUSA
  3. 3.Institute for Advanced Materials, Academy of Advanced OptoelectronicsSouth China Normal UniversityGuangzhouPeople’s Republic of China

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