Quantitative Compositional Depth Profiling

Chapter
Part of the Springer Series in Surface Sciences book series (SSSUR, volume 49)

Abstract

Any quantitative surface analysis has to be based on knowledge of the in-depth distribution of composition (Sects. 4.3.3 and 4.4.3). Obtaining informatiosn on the latter is the main purpose of any depth profiling method. There are two different approaches: nondestructive and destructive depth profiling. Whereas nondestructive methods (such as angle-resolved XPS, Sect. 7.2.1) give indirect composition – depth information, the destructive method of sputter depth profiling has the great advantage of immediately presenting an image of the in-depth distribution of composition (with more or less obvious distortions). Because of their relatively moderate matrix effects, AES and XPS in combination with argon ion bombardment have become the most popular tool for depth profiling of major components in thin films, with a clear preference of AES depth profiling as explained in Sect. 7.1.6.

Keywords

Depth Profile Emission Angle Depth Resolution Sample Rotation Attenuation Length 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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© Springer-Verlag Berlin Heidelberg 2013

Authors and Affiliations

  1. 1.Max-Planck-Institute for Intelligent Systems (formerly Max-Planck-Institute for Metals Research)StuttgartGermany

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