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Atomic Processes in Basic and Applied Physics pp 283–306Cite as

Storage-Ring Studies of Dielectronic Recombination as a Tool for Precision Spectroscopy

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Part of the book series: Springer Series on Atomic, Optical, and Plasma Physics ((SSAOPP,volume 68))

Abstract

The resonant channel of photorecombination (PR), the dielectronic recombination (DR) is a unique tool to investigate a broad range of questions in astrophysics, plasma physics, fundamental interactions, atomic, and nuclear physics. In this chapter, recent developments in the utilization of DR as a sensitive spectroscopic probe for heavy few-electron ions are discussed. The advances in the field are exemplified by a series of experimental studies carried out at the heavy-ion storage rings ESR in Darmstadt and TSR in Heidelberg.

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Acknowledgements

We would like to acknowledge the fruitful and long-standing collaborations with the many colleagues from all over the world. We were particularly fortunate to work together with Alfred Müller, Werner Scheid, Stefan Schippers, and Andreas Wolf in the field of DR for more than 15 years. Additionally, we would like to mention the support from the technical staffs and in particular from the accelerator and storage-ring crews at the GSI Helmholtzzentrum für Schwerionenforschung in Darmstadt (ESR) and at the Max-Planck Institut für Kernphysik in Heidelberg (TSR).

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  1. Institut für Atom- und Molekülphysik, Justus-Liebig-Universität, Leihgesterner Weg 217, 35392, Giessen, Germany

    C. Brandau

  2. GSI Helmholtzzentrum für Schwerionenforschung, Planckstr.1, 64291, Darmstadt, Germany

    C. Brandau & C. Kozhuharov

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  1. C. Brandau
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  1. , Optical Department, P.N.Lebedev Physical Institute, Leninskii prospect 53, Moscow, 119991, Russia

    Viacheslav Shevelko

  2. , Plasma Physics, National Institute for Fusion Science, Oroshi 332-6, Toki, Gifu, 509-5292, Japan

    Hiro Tawara

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Brandau, C., Kozhuharov, C. (2012). Storage-Ring Studies of Dielectronic Recombination as a Tool for Precision Spectroscopy. In: Shevelko, V., Tawara, H. (eds) Atomic Processes in Basic and Applied Physics. Springer Series on Atomic, Optical, and Plasma Physics, vol 68. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-25569-4_11

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