Abstract
In order to avoid the macroscopically inhomogeneous characteristics of large area films which prepared by Photo-assisted MOCVD (Metal Organic Chemical Vapor Deposition), processed by RIP (Rapid isothermal processing) technique, etc., the calculation of luminance uniformity is necessary. This thesis gives a basic calculation method about the radiation intensity of illumination caused by halogen-tungsten lamp like line radiation sources. A concept of average radiation intensity (ARI) of illumination was proposed to give quantification when radiation intensity is Rapidly Changed. The distribution of radiation sources influence on ARII is discussed. The numerical solution carried out by computer simulation directly confirms that the layout of radiation sources in this paper enhances the luminance uniformity. Consequently, the macroscopically inhomogeneous of the film is improved.
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Chen, J., Tan, Jw., Liu, Qh., Zhang, Fr. (2011). Computer Simulation and Calculation for Luminance Uniformity of Straight Line Radiation Sources. In: Liu, B., Chai, C. (eds) Information Computing and Applications. ICICA 2011. Lecture Notes in Computer Science, vol 7030. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-25255-6_95
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DOI: https://doi.org/10.1007/978-3-642-25255-6_95
Publisher Name: Springer, Berlin, Heidelberg
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