Passive Photonic Devices in Glass

Chapter
Part of the Topics in Applied Physics book series (TAP, volume 123)

Abstract

Femtosecond laser microfabrication offers the potential for writing passive photonic circuits inside bulk glasses, for use in last-mile photonic networks, sensing, and lab-on-a-chip applications. In this chapter, the fabrication methods for writing low-loss optical waveguides along with waveguide and device characterization techniques are reviewed. The advantages and disadvantages of femtosecond laser writing are analyzed and compared with existing planar lithographic fabrication techniques.

Keywords

Femtosecond Laser Wavelength Division Multiplex Directional Coupler Heat Accumulation Coupling Ratio 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

References

  1. 1.
    Y. Hibino, MRS Bull. 28(5), 365 (2003)CrossRefGoogle Scholar
  2. 2.
    S.M. Eaton, W. Chen, L. Zhang, H. Zhang, R. Iyer, J.S. Aitchison, P.R. Herman, IEEE Photon. Technol. Lett. 18(17–20), 2174 (2006)ADSCrossRefGoogle Scholar
  3. 3.
    L.M. Tong, R.R. Gattass, I. Maxwell, J.B. Ashcom, E. Mazur, Opt. Commun. 259(2), 626 (2006)ADSCrossRefGoogle Scholar
  4. 4.
    R.R. Gattass, E. Mazur, Nat. Photon. 2(4), 219 (2008)ADSCrossRefGoogle Scholar
  5. 5.
    S.M. Eaton, H. Zhang, P.R. Herman, F. Yoshino, L. Shah, J. Bovatsek, A.Y. Arai, Opt. Exp. 13(12), 4708 (2005)ADSCrossRefGoogle Scholar
  6. 6.
    S.M. Eaton, Contrasts in thermal diffusion and heat accumulation effects in the fabrication of waveguides in glasses using variable repetition rate femtosecond laser. Ph.D. thesis (2008)Google Scholar
  7. 7.
    C. Florea, K. Winick, J. Lightwave Technol. 21(1), 246 (2003)ADSCrossRefGoogle Scholar
  8. 8.
    Y. Okamura, S. Yoshinaka, S. Yamamoto, Appl. Opt. 22(23), 3892 (1983)ADSCrossRefGoogle Scholar
  9. 9.
    H. Zhang, S.M. Eaton, P.R. Herman, Opt. Exp. 14(11), 4826 (2006)ADSCrossRefGoogle Scholar
  10. 10.
    S.M. Eaton, H. Zhang, M.L. Ng, J. Li, W.J. Chen, S. Ho, P.R. Herman, Opt. Express 16(13), 9443 (2008)ADSCrossRefGoogle Scholar
  11. 11.
    R. Osellame, N. Chiodo, G. Della Valle, G. Cerullo, R. Ramponi, P. Laporta, A. Killi, U. Morgner, O. Svelto, IEEE J. Sel. Top. Quantum Electron. 12(2), 277 (2006)CrossRefGoogle Scholar
  12. 12.
    L. Shah, A. Arai, S.M. Eaton, P.R. Herman, Opt. Exp. 13(6), 1999 (2005)ADSCrossRefGoogle Scholar
  13. 13.
    D.J. Little, M. Ams, P. Dekker, G.D. Marshall, J.M. Dawes, M.J. Withford, Opt. Express 16(24), 20029 (2008)ADSCrossRefGoogle Scholar
  14. 14.
    W. Gawelda, D. Puerto, J. Siegel, A. Ferrer, A.R. de la Cruz, H. Fernandez, J. Solis, Appl. Phys. Lett. 93(12), 121109 (2008)ADSCrossRefGoogle Scholar
  15. 15.
    A. Ferrer, V. Diez-Blanco, A. Ruiz, J. Siegel, J. Solis, Appl. Surface Sci. 254(4), 1121 (2007)ADSCrossRefGoogle Scholar
  16. 16.
    C. Mauclair, A. Mermillod-Blondin, N. Huot, E. Audouard, R. Stoian, Opt. Exp. 16(8), 5481 (2008)ADSCrossRefGoogle Scholar
  17. 17.
    Y. Nasu, M. Kohtoku, Y. Hibino, Opt. Lett. 30(7), 723 (2005)ADSCrossRefGoogle Scholar
  18. 18.
    W. Yang, P.G. Kazansky, Y. Shimotsuma, M. Sakakura, K. Miura, K. Hirao, Appl. Phys. Lett. 93(17), 171109 (2008)ADSCrossRefGoogle Scholar
  19. 19.
    W.J. Yang, E. Bricchi, P.G. Kazansky, J. Bovatsek, A.Y. Arai, Opt. Exp. 14(21), 10117 (2006)ADSCrossRefGoogle Scholar
  20. 20.
    R. Osellame, S. Taccheo, M. Marangoni, R. Ramponi, P. Laporta, D. Polli, S. De Silvestri, G. Cerullo, J. Opt. Soc. Am. B 20(7), 1559 (2003)ADSCrossRefGoogle Scholar
  21. 21.
    M. Ams, G.D. Marshall, D.J. Spence, M.J. Withford, Opt. Exp. 13(15), 5676 (2005)ADSCrossRefGoogle Scholar
  22. 22.
    Y. Cheng, K. Sugioka, K. Midorikawa, M. Masuda, K. Toyoda, M. Kawachi, K. Shihoyama, Opt. Lett. 28(1), 55 (2003)ADSCrossRefGoogle Scholar
  23. 23.
    R.R. Thomson, A.S. Bockelt, E. Ramsay, S. Beecher, A.H. Greenaway, A.K. Kar, D.T. Reid, Opt. Exp. 16(17), 12786 (2008)Google Scholar
  24. 24.
    M. Ams, G.D. Marshall, M.J. Withford, Opt. Exp. 14(26), 13158 (2006)ADSCrossRefGoogle Scholar
  25. 25.
    Y. Shimotsuma, P.G. Kazansky, J. Qiu, K. Hirao, Phys. Rev. Lett. 91(24), 247405 (2003)ADSCrossRefGoogle Scholar
  26. 26.
    C. Hnatovsky, R.S. Taylor, E. Simova, V.R. Bhardwaj, D.M. Rayner, P.B. Corkum, Opt. Lett. 30(14), 1867 (2005)ADSCrossRefGoogle Scholar
  27. 27.
    G. Cerullo, R. Osellame, S. Taccheo, M. Marangoni, D. Polli, R. Ramponi, P. Laporta, S. De Silvestri, Opt. Lett. 27(21), 1938 (2002)ADSCrossRefGoogle Scholar
  28. 28.
    J. Siegel, J.M. Fernandez-Navarro, A. Garcia-Navarro, V. Diez-Blanco, O. Sanz, J. Solis, F. Vega, J. Armengol, Appl. Phys. Lett. 86(12) (2005). 121109Google Scholar
  29. 29.
    C. Schaffer, J. Garcia, E. Mazur, Appl. Phys. A A76(3), 351 (2003)ADSCrossRefGoogle Scholar
  30. 30.
    J. Chan, T. Huser, S. Risbud, J. Hayden, D. Krol, Appl. Phys. Lett. 82(15), 2371 (2003)ADSCrossRefGoogle Scholar
  31. 31.
    C. Hnatovsky, R.S. Taylor, E. Simova, V.R. Bhardwaj, D.M. Rayner, P.B. Corkum, J. Appl. Phys. 98(1), 013517 (2005)ADSCrossRefGoogle Scholar
  32. 32.
    C. Schaffer, A. Brodeur, E. Mazur, Meas. Sci. Technol. 12(11), 1784 (2001)ADSCrossRefGoogle Scholar
  33. 33.
    K. Minoshima, A. Kowalevicz, I. Hartl, E. Ippen, J. Fujimoto, Opt. Lett. 26(19), 1516 (2001)ADSCrossRefGoogle Scholar
  34. 34.
    R. Osellame, N. Chiodo, V. Maselli, A. Yin, M. Zavelani-Rossi, G. Cerullo, P. Laporta, L. Aiello, S. De Nicola, P. Ferraro, A. Finizio, G. Pierattini, Opt. Exp. 13(2), 612 (2005)ADSCrossRefGoogle Scholar
  35. 35.
    S.M. Eaton, M.L. Ng, R. Osellame, P.R. Herman, J. Non-Cryst. Solids 357(11–13), 2387 (2011)ADSCrossRefGoogle Scholar
  36. 36.
    M. Pospiech, M. Emons, A. Steinmann, G. Palmer, R. Osellame, N. Bellini, G. Cerullo, U. Morgner, Opt. Exp. 17(5), 3555 (2009)ADSCrossRefGoogle Scholar
  37. 37.
    W. Yang, C. Corbari, P.G. Kazansky, K. Sakaguchi, I.C. Carvalho, Opt. Exp. 16(20), 16215 (2008)ADSCrossRefGoogle Scholar
  38. 38.
    K. Davis, K. Miura, N. Sugimoto, K. Hirao, Opt. Lett. 21(21), 1729 (1996)ADSCrossRefGoogle Scholar
  39. 39.
    D. Homoelle, S. Wielandy, A. Gaeta, N. Borrelli, C. Smith, Opt. Lett. 24(18), 1311 (1999)ADSCrossRefGoogle Scholar
  40. 40.
    J.R. Liu, Z.Y. Zhang, S.D. Chang, C. Flueraru, C.P. Grover, Opt. Commun. 253(4-6), 315 (2005)ADSCrossRefGoogle Scholar
  41. 41.
    G. Della Valle, R. Osellame, P. Laporta, J. Opt. A: Pure Appl. Opt. (1), 013001 (2009)Google Scholar
  42. 42.
    S. Ik-Bu, L. Man-Seop, C. Jeong-Yong, IEEE Photon. Technol. Lett. 17(11), 2349 (2005)ADSCrossRefGoogle Scholar
  43. 43.
    S. Nolte, M. Will, J. Burghoff, A. Tuennermann, Appl. Phys. A (Mater. Sci. Process.) A77(1), 109 (2003)Google Scholar
  44. 44.
    A. Streltsov, N. Borrelli, Opt. Lett. 26(1), 42 (2001)ADSCrossRefGoogle Scholar
  45. 45.
    W. Watanabe, T. Asano, K. Yamada, K. Itoh, J. Nishii, Opt. Lett. 28(24), 2491 (2003)ADSCrossRefGoogle Scholar
  46. 46.
    K. Minoshima, A. Kowalevicz, E. Ippen, J. Fujimoto, Opt. Exp. 10(15), 645 (2002)ADSGoogle Scholar
  47. 47.
    A. Szameit, F. Dreisow, T. Pertsch, S. Nolte, A. Tnnermann, Opt. Exp. 15(4), 1579 (2007)ADSCrossRefGoogle Scholar
  48. 48.
    G.D. Marshall, A. Politi, J.C.F. Matthews, P. Dekker, M. Ams, M.J. Withford, J.L. O’Brien, Opt. Exp. 17(15), 12546 (2009)ADSCrossRefGoogle Scholar
  49. 49.
    L. Sansoni, F. Sciarrino, G. Vallone, P. Mataloni, A. Crespi, R. Ramponi, R. Osellame, Phys. Rev. Lett. 105(20), 200503 (2010)ADSCrossRefGoogle Scholar
  50. 50.
    R. Osellame, V. Maselli, N. Chiodo, D. Polli, R.M. Vazquez, R. Ramponi, G. Cerullo, Electron. Lett. 41(6), 315 (2005)CrossRefGoogle Scholar
  51. 51.
    K. Suzuki, V. Sharma, J.G. Fujimoto, E.P. Ippen, Opt. Exp. 14(6), 2335 (2006)ADSCrossRefGoogle Scholar
  52. 52.
    K. Imoto, H. Sano, M. Miyazaki, Appl. Opt. 26(19), 4214 (1987)ADSCrossRefGoogle Scholar
  53. 53.
    F. Ladouceur, J.D. Love, Silica-based Buried Channel Waveguides and Devices (Chapman and Hall, London, 1996)Google Scholar
  54. 54.
    S.M. Eaton, W. Chen, H. Zhang, R. Iyer, M.L. Ng, S. Ho, J. Li, J.S. Aitchison, P.R. Herman, IEEE J. Lightwave Technol. 27(9) (2009)Google Scholar
  55. 55.
    R.D. Feldman, E.E. Harstead, S. Jiang, T.H. Wood, M. Zirngibl, IEEE J. Lightwave Technol. 16(9), 1546 (1998)ADSCrossRefGoogle Scholar
  56. 56.
    P.L. Auger, S. Iraj Najafi, Opt. Comm. 111(1-2), 43 (1994)ADSCrossRefGoogle Scholar
  57. 57.
    I.P. Januar, A.R. Mickelson, Opt. Lett. 18(6), 417 (1993)ADSCrossRefGoogle Scholar
  58. 58.
    D.B. Mortimore, Electron. Lett. 21(17), 742 (1985)CrossRefGoogle Scholar
  59. 59.
    C.R. Doerr, M. Cappuzzo, E. Chen, A. Wong-Foy, L. Gomez, A. Griffin, L. Buhl, IEEE Photon. Technol. Lett. 17(6), 1211 (2005)ADSCrossRefGoogle Scholar
  60. 60.
    K. Jinguji, N. Takato, A. Sugita, M. Kawachi, Electron. Lett. 26(17), 1326 (1990)CrossRefGoogle Scholar
  61. 61.
    M. Olivero, M. Svalgaard, Opt. Exp. 13(21), 8390 (2005)ADSCrossRefGoogle Scholar
  62. 62.
    W.J. Chen, S.M. Eaton, H. Zhang, P.R. Herman, Opt. Exp. 16(15), 11470 (2008)ADSCrossRefGoogle Scholar
  63. 63.
    A. Takagi, K. Jinguji, M. Kawachi, IEEE J. Lightwave Technol. 10(6), 735 (1992)ADSCrossRefGoogle Scholar
  64. 64.
    A. Crespi, Y. Gu, B. Ngamsom, H.J.W.M. Hoekstra, C. Dongre, M. Pollnau, R. Ramponi, H.H. van den Vlekkert, P. Watts, G. Cerullo, R. Osellame, Lab Chip 10(9), 1167 (2010)CrossRefGoogle Scholar
  65. 65.
    M.R. Poulsen, P.I. Borel, J. Fage-Pedersen, J. Hubner, M. Kristensen, J.H. Povlsen, K. Rottwitt, M. Svalgaard, W. Svendsen, Opt. Eng. 42(10), 2821 (2003)ADSCrossRefGoogle Scholar
  66. 66.
    W. Watanabe, Y. Note, K. Itoh, Opt. Lett. 30(21), 2888 (2005)ADSCrossRefGoogle Scholar
  67. 67.
    A.M. Kowalevicz, V. Sharma, E.P. Ippen, J.G. Fujimoto, K. Minoshima, Opt. Lett. 30(9), 1060 (2005)ADSCrossRefGoogle Scholar
  68. 68.
    R.R. Thomson, H.T. Bookey, N.D. Psaila, A. Fender, S. Campbell, W.N. MacPherson, J.S. Barton, D.T. Reid, A.K. Kar, Opt. Exp. 15(18), 11691 (2007)ADSCrossRefGoogle Scholar
  69. 69.
    Y. Nasu, M. Kohtoku, Y. Hibino, Y. Inoue, Jpn. J. Appl. Phys. 44, L1446 (2005)ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2012

Authors and Affiliations

  1. 1.Istituto di Fotonica e Nanotecnologie – Consiglio Nazionale delle Ricerche (IFN-CNR)MilanItaly
  2. 2.Edward S. Rogers Department of Electrical and Computer EngineeringUniversity of TorontoTorontoCanada

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