Abstract
This chapter provides an extended overview on todayʼs optical materials, which are commonly used for optical components and systems. In Sect. 5.1 the underlying physical background on light–matter interaction is presented, where the phenomena of refraction (linear and nonlinear), reflection, absorption, emission and scattering are introduced. Sections 5.2–5.8 focus on the detailed properties of the most common types of optical materials, such as glass, glass ceramics, optoceramics, crystals, and plastics. In addition, special materials displaying “unusual nonlinear” or “quasi-nonreversible” optical behavior such as photorefractive or photorecording solids are described in Sect. 5.10. The reader could use this chapter as either a comprehensive introduction to the field of optical materials or as a reference text for the most relevant material information.
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Abbreviations
- AI:
-
absorbing ion
- ALON:
-
aluminum oxynitride
- AR:
-
antireflection
- ARS:
-
angle-resolved scattering
- BGO:
-
Bi12GeO20
- BSO:
-
Bi12SiO20
- BTO:
-
Bi12TiO20
- CA:
-
central atom
- CCD:
-
charge-coupled device
- CD:
-
compact disc
- CIE:
-
Commission Internationale de lʼEclairage
- CN-PPV:
-
poly(para-phenyleneethylene)
- COC:
-
cyclic olefin copolymer
- COP:
-
cyclic olefin polymer
- CT:
-
computed tomography
- CTE:
-
coefficient of thermal expansion
- CVD:
-
chemical vapor deposition
- CW:
-
continuous wave
- DCM:
-
4-(dicyanomethylene)-2-methyl-6-(p-dimethylaminostyryl)-4H-pyran
- DFWM:
-
degenerate four-wave mixing
- DWDM:
-
dense wavelength division multiplexed
- EL:
-
electroluminescence
- EN:
-
European Normalization
- EN:
-
electroless nickel
- EO:
-
electrooptic
- EOM:
-
electrooptic modulator
- FOM:
-
figure of merit
- FWM:
-
four-wave mixing
- FZP:
-
Fresnel zone plate
- GOS:
-
Gd2O2S
- HEP:
-
high-energy physics
- HID:
-
high-intensity discharge
- HIP:
-
hot isostatic press
- HMO:
-
heavy metal oxide
- HOMO:
-
highest occupied molecular orbital
- IAD:
-
ion-assisted deposition
- IR:
-
infrared
- ITO:
-
indium–tin oxide
- KDP:
-
potassium dihydrogen phosphate
- KLM:
-
Kerr-lens mode-locking
- KTN:
-
KTa1-x Nb x O3
- LC:
-
liquid crystal
- LD:
-
laser diode
- LED:
-
light-emitting diode
- LHO:
-
La2Hf2O7
- LPPP:
-
ladder-PPP
- LSR:
-
liquid silicone rubber
- LUMO:
-
lowest unoccupied molecular orbital
- MEH-PPV:
-
poly[2-methoxy-5(2-ethylhexyloxy)-1,4-phenylenevinylene]
- MQW:
-
multiquantum well
- MTF:
-
modulation transfer function
- NA:
-
numerical aperture
- NB:
-
narrow beam
- NLO:
-
nonlinear optical
- NPB:
-
N, N′-diphenyl-N, N′-denaphthyl-(1, 1′)-biphenyl-4, 4′-diamine
- NRI:
-
nonresonant intrinsic
- OD:
-
optical density
- OD:
-
output diode
- OFC:
-
oxygen-free copper
- OLED:
-
organic light-emitting device
- PC:
-
photonic crystal
- PCA:
-
translucent polycrystalline aluminum
- PDLC:
-
polymer-dispersed liquid crystal
- PEDT/PSS:
-
polyethylenedioxythiophene/ polystyrylsulfonat
- PET:
-
polyethylene
- PET:
-
positron emission tomography
- PF:
-
polyfluorene
- PL:
-
photoluminescence
- PMMA:
-
polymethylmethacrylate
- PNLC:
-
polymer network liquid crystal
- PPE:
-
personal protective equipment
- PPP:
-
poly-p-phenylene
- PPV:
-
poly-para-phenylenevinylene
- PSU:
-
polysulfone
- PT:
-
polythiophene
- PVD:
-
physical vapor deposition
- QPM:
-
quasi-phase matching
- RE:
-
rare-earth
- RMS:
-
root-mean-square
- SBN:
-
Sr1-x Ba x Nb2O6
- SC:
-
supercontinuum
- SCSi:
-
single-crystal silicon
- SHG:
-
second-harmonic generation
- SI:
-
Système International
- SM:
-
small molecule
- STP:
-
standard temperature and pressure
- THG:
-
third-harmonic generation
- TM:
-
transition metal
- TM:
-
transversal magnetic
- TM:
-
transverse magnetic
- TPA:
-
two-photon absorption
- TPD:
-
N, N′-diphenyl-N, N′-bis-(3-methylphenyl)-(1, 1′)-biphenyl-4-4′-diamine
- UFC:
-
ultra fast ceramics
- UV:
-
ultraviolet
- Vis:
-
visible
- YAG:
-
yttrium aluminium garnet
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Brinkmann, M. et al. (2012). Optical Materials and Their Properties. In: Träger, F. (eds) Springer Handbook of Lasers and Optics. Springer Handbooks. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-19409-2_5
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