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An Investigation on ALD Thin Film Evanescent Waveguide Sensor for Biomedical Application

  • Agung Purniawan
  • Paddy French
  • Gregory Pandraud
  • Pasqualina M. Sarro
Conference paper
Part of the Communications in Computer and Information Science book series (CCIS, volume 127)

Abstract

In this paper, we investigate the use of Al2O3 and TiO2 deposited by Atomic Layer Deposition (ALD) as evanescent waveguide sensors. These sensors will be employed to detect bacteria concentration in drain fluid in post anastomosis surgery. Surface roughness, conformality, and homogeneity of the sensor material are very important factors to obtain high sensitive sensor. ALD fulfill these requirements. Surface roughness before and after fabrication are investigated using AFM. As we aim at freestanding structure the buckling of freestanding ALD films is studied. Finally we build an optical characterization set up and measured the propagation loss of Al2O3 and TiO2 waveguides at 1.3 um. The results show that ALD thin films can be used as waveguide material to obtain very high sensitive sensors.

Keywords

Evanescent waveguide Atomic layer deposition Propagation loss 

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Copyright information

© Springer-Verlag Berlin Heidelberg 2011

Authors and Affiliations

  • Agung Purniawan
    • 1
  • Paddy French
    • 1
  • Gregory Pandraud
    • 2
  • Pasqualina M. Sarro
    • 2
  1. 1.Electronic Instrumentation Laboratory (EI)-DIMESTU DelftDelftThe Netherlands
  2. 2.Electronic Components, Technology and Materials (ECTM)-DIMESTU DelftDelftThe Netherlands

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