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High Speed Cache Design Using Multi-diameter CNFET at 32nm Technology

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Information and Communication Technologies (ICT 2010)

Part of the book series: Communications in Computer and Information Science ((CCIS,volume 101))

Abstract

This paper proposes a high-speed multi-diameter CNFET-based 7T (seven transistor) SRAM (static random access memory) cell. It investigates the impact of process, voltage and temperature (PVT) variations on its design metrics and compares the results with its counterpart – CMOS-based 7T SRAM cell. The proposed design offers 77.4× improvement in write access time along with 88.1× reduction in write access time variation and 117.8× saving in write power along with substantial reduction in write EDP/write EDP variation. The proposed memory cell shows 40% improvement in SNM (static noise margin) and better robustness against PVT variations.

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Islam, A., Hasan, M. (2010). High Speed Cache Design Using Multi-diameter CNFET at 32nm Technology. In: Das, V.V., Vijaykumar, R. (eds) Information and Communication Technologies. ICT 2010. Communications in Computer and Information Science, vol 101. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-15766-0_31

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  • DOI: https://doi.org/10.1007/978-3-642-15766-0_31

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-15765-3

  • Online ISBN: 978-3-642-15766-0

  • eBook Packages: Computer ScienceComputer Science (R0)

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