Abstract
In the semiconductor manufacturing process, the endpoint of plasma etch process can be determined by the graphics based detection in order to avoid the loss of over-etching and under-etching. Our approach in current study can be conducted as one way to real-time monitor and judge the endpoint instead of observing it manually. When the endpoint occurs, this system can improve the etch processes and provide instant shutdown recommendations. This method makes use of Radial Basis Function (RBF) network’s functional approximation in time-series modeling and in pattern classification. By training with enough samples, the judge will be more accurate. All the samples are probed with optical emission spectroscopy (OES) sensor in real plasma etch process and for both network training and test.
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References
Tou, J.T., Gonzalez, R.C.: Pattern Recognition. Addison-Wesley, Reading (1974)
Hong, S.J., May, G.S., Park, D.C.: Neural network modeling of reactive ion etching using optical emission spectroscopy data. IEEE Transactions 16(4), 598–608 (2003)
Czebiniak, J.M.: End Point Detection of Plasma Etching Using Optical Methods. In: Annual Microelectronic Engineering Conference (May 2006)
Bors, A.G.: Introduction of the Radial Basis Function Network. University of York, UK
Quirk, M., Serda, J.: Semiconductor Manufacturing Technology. Pearson Education International Presses, ISBN 978-7-121-08944-2
Haykin, S.: Neural Networks – A Comprehensive Foundation. Prentice Hall, Englewood Cliffs (1998); ch. 7: Radial-Basis Function Networks
May, G.S., Spanos, C.J.: Fundamentals of Semiconductor Manufacturing and Process Control. IEEE, Wiley-Interscience
Bors, A.G., Pitas, I.: Median radial basis functions neural network. IEEE Trans. on Neural Networks (1996)
Park, J., Sandberg, J.W.: Universal approximation using radial basis functions network. Neural Computation 3 (1991)
Haykin, S.: Neural Networks: A comprehensive Foundation. Prentice Hall, Upper Saddle River (1994)
Poggio, T., Girosi, F.: Networks for approximation and learning. Proc. IEEEÂ 78(9) (1990)
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Zhao, SK., Kim, MW., Han, YS., Jeon, SY., Lee, YK., Han, SS. (2010). Radial Basis Function Network for Endpoint Detection in Plasma Etch Process. In: Zeng, Z., Wang, J. (eds) Advances in Neural Network Research and Applications. Lecture Notes in Electrical Engineering, vol 67. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-12990-2_29
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DOI: https://doi.org/10.1007/978-3-642-12990-2_29
Publisher Name: Springer, Berlin, Heidelberg
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