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Near-Field Microwave Microscopy for Nanoscience and Nanotechnology

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Scanning Probe Microscopy in Nanoscience and Nanotechnology 2

Part of the book series: NanoScience and Technology ((NANO))

Abstract

We have demonstrated the possibility of near-field microwave imaging of physical structures, such as thin films, bulk material, fluids, etc. by using a near-field microwave microscopy (NFMM). We have developed theoretical models for the microwave reflection coefficient S 11 and resonant frequency shift Δf ∕ f 0 dependence on electromagnetic characteristics, in particular, electrical conductivity, dielectric permittivity, magnetic permeability to distinguish the spatial changes of these parameters in materials under various preparation and measurement conditions. The models are based on standard transmission line theory, material perturbation concept as well as finite-element numerical simulation methods. The NFMM is a noncontact, nondestructive and label-free evaluation tool to obtain material properties with high contrast and with high spatial resolution. The smallest detectable change in solvent (glucose) concentration is about 0.5 mg/ml at SNR = 20 dB, the smallest detectable change in permittivity (dielectrics) is about 0.2 at SNR = 30 dB, the smallest detectable change in conductivity (semiconductors and perfect metals) is about 0.01 S/m at SNR = 60 dB, the smallest detectable change in permeability (Permalloy) is about 10 at SNR = 40 dB, and the smallest detectable change in thickness (self-assembled monolayers, SAMs) is 2 nm at SNR = 50 dB. The results clearly show the sensitivity and the usefulness of NFMM for many device applications at microwave frequency such as 3D surface mapping and topography, material characteristics (permittivity, permeability, conductivity, carriers density, etc.) point-by-point distribution, and label-free biosensing (DNA, SAM, aqueous solution of glucose, NaCl, etc.).

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Acknowledgements

This work was supported by Sogang University Special Research Grant (2009, 2010), Seoul Research and Business Development Program (10816), Korea Research Foundation Grant (KRF-2008-615-C00001), and National Research Foundation of Korea Grant (2009-0073557, 2009-0093822, and 2010-0012037).

The author would like to thank Prof. Brian Oetiker and Prof. Khachatur Nerkararyan for careful reading and comments of the manuscript.

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Authors and Affiliations

  1. Department of Physics and Basic Science Institute for Cell Damage Control, Sogang University, Seoul, 121-742, Korea

    Kiejin Lee, Harutyun Melikyan & Arsen Babajanyan

  2. Department of Physics, Sam Houston State University, Texas, 77341, USA

    Barry Friedman

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  1. Kiejin Lee
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  2. Harutyun Melikyan
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  3. Arsen Babajanyan
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  4. Barry Friedman
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Correspondence to Kiejin Lee .

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Editors and Affiliations

  1. Nanoprobe Lab. Bio- & Nanotechnology &, Biomimetics (NLB²), Ohio State University, West 19th Avenue 201, Columbus, 43210-1142, Ohio, USA

    Bharat Bhushan

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Lee, K., Melikyan, H., Babajanyan, A., Friedman, B. (2011). Near-Field Microwave Microscopy for Nanoscience and Nanotechnology. In: Bhushan, B. (eds) Scanning Probe Microscopy in Nanoscience and Nanotechnology 2. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-10497-8_5

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