Skip to main content

Gaseous Phase and Surface Processes

  • Chapter
Handbook of Thin-Film Technology
  • 5865 Accesses

Zusammenfassung

Consider the following reactions:

$${\mathrm{a)}}\quad 2\,\mathrm{U}+3\,\mathrm{V}\rightarrow\mathrm{W}+2\,\mathrm{Z}$$
$${\mathrm{b)}}\quad \mathrm{U}+\mathrm{V}\rightarrow\mathrm{W}+\mathrm{Z}$$
$${\mathrm{c)}}\quad \mathrm{U}\rightarrow\mathrm{W}+\mathrm{Z}@,,$$
(5.1)

where U, V, W and Z are molecules. The reactions are denominated elementarily, if they occur in one step. This means all molecules in a), b) must collide at the same time, and/or in c) the decomposition “in a step” must take place. Reaction a) is in all probability not an elementary reaction, since five molecules must collide at the same time. For the reactions b) 2; an elementary reaction is conceivable:

$$\mathrm{O}^{+}+\mathrm{O}_{2}\rightarrow\mathrm{O}+\mathrm{O}_{2}^{+}\,;$$

likewise for reaction c):

$$\mathrm{A}^{\ast}\rightarrow\mathrm{A}+{h}\nu\,.$$

On the other hand, it is well known that the following reaction is not elementary:

$$\mathrm{Cl}_{2}+{\mathrm{H}}_{2}\rightarrow 2\,{\mathrm{HCl}}\,.$$

This reaction corresponds to b). From this it follows that on the basis of the stoichiometric equations a)–c) it cannot decided whether a reaction is elementary or not. However, chemical reactions can be divided into different basic steps:

  1. 1.

    Unimolecular reactions:

    $$\mathrm{U}\rightarrow\text{final products}.$$
  2. 2.

    Bimolecular reactions:

    $$\mathrm{U}+\mathrm{V}\rightarrow\text{final products}.$$

At high pressure triple molecular reactions can also occur:

$$\mathrm{U}+\mathrm{V}+\mathrm{W}\rightarrow\text{final products}.$$

In low pressure plasmas the reactions are usually complex. By means of the so-called stoichiometric coefficients the reaction rates can be defined. The reaction rates for reactants (U, V in Eq. (5.1)) are negative, for products positive:

$$R=\frac{1}{\alpha_{j}}\frac{\mathrm{d}n_{j}}{\mathrm{d}t}\,,$$
(5.2)

here

n j :

is volume density of molecules at the jth component.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 99.00
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 129.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book
USD 179.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

References

  1. Schlichting, H.: Methoden und Mechanismen der thermischen Desorption: Adsorptions-, Desorptions-Kinetik, Epitaxie und Ordnung von Edelgasschichten auf Ru(001). Im Fachbereich Physik der Technischen Universität München eingereichte Dissertation. München: 1990.

    Google Scholar 

  2. Christmann K (1991) Introduction to Surface Physical Chemistry. Springer, New York

    Book  Google Scholar 

  3. Demtröder W (2000) Atome, Moleküle und Festkörper Experimentalphysik, vol. 3. Springer, Berlin, Heidelberg, New York, Barcelona, Hongkong, London, Mailand, Paris, Singapur, Tokio

    Google Scholar 

  4. Henzler M (1994) Oberflächenphysik des Festkörpers. Teubner, Stuttgart

    Book  Google Scholar 

  5. Bean, F. E.: Anisotropic etching of silicon, IEEE Trans. Electron.Devices ED-25, No. 10, pp. 1185–1193 (Okt. 1978)

    Google Scholar 

  6. McCracken RJ (1975) The behaviour of surfaces under ion bombardement. RepProgPhys 38(2):241–327

    Article  Google Scholar 

  7. Behrisch R, Eckstein W (eds) (2007) Sputtering by Particle Bombardment: Experiments and Computer Calculations from Threshold to M $$\mathrm{e\kern-0.7ptV}$$ Energies. Springer, Berlin

    Google Scholar 

  8. Duke CB, Park RL (1972) Surface structure – An emering spectroscopy. Phys Today 25(8):23–28

    Article  Google Scholar 

Download references

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2015 Springer-Verlag Berlin Heidelberg

About this chapter

Cite this chapter

Frey, H. (2015). Gaseous Phase and Surface Processes. In: Frey, H., Khan, H.R. (eds) Handbook of Thin-Film Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-05430-3_5

Download citation

Publish with us

Policies and ethics